Hostname: page-component-76fb5796d-9pm4c Total loading time: 0 Render date: 2024-04-25T16:55:35.272Z Has data issue: false hasContentIssue false

FLB/TEM Observation of Defect Structure Underneath an Indentation in Silicon

Published online by Cambridge University Press:  10 February 2011

A. Shimatani
Affiliation:
Department of Quantum Engineering, Nagoya University, Nagoya 464-8603, Japan, saka@numse.nagoya-u.ac.jp
T. Nango
Affiliation:
Department of Quantum Engineering, Nagoya University, Nagoya 464-8603, Japan, saka@numse.nagoya-u.ac.jp
Suprijadi
Affiliation:
Department of Quantum Engineering, Nagoya University, Nagoya 464-8603, Japan, saka@numse.nagoya-u.ac.jp
H. Saka
Affiliation:
Department of Quantum Engineering, Nagoya University, Nagoya 464-8603, Japan, saka@numse.nagoya-u.ac.jp
Get access

Abstract

Defect structure beneath and near Vickers indentations made with loads of 10, 25 and 50g in Si has been studied in detail by TEM. Both plan-view and cross-sectional observations have been made. Beneath the 10 and 25g indentations an amorphous phase is formed, but beneath the 50g indentation no amorphous phase is formed.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Pethica, J.B., Hutchings, R. and Oliver, W.C.,Phil.Mag.A,48,593(1983).Google Scholar
2.Newly, D., Wilkins, M.A., and Pollcok, H.M.,J.Phys., E15,119(1982).Google Scholar
3.Page, T.F.,J.Mater.Res., 7,450(1992).Google Scholar
4.Young, R.J.,E.C.G., Kirk, Williams, D.A. and Ahmed, H,in Specimen Preparation for Transmission Electron Microscopy of Materials II editedby Anderson, R. (Mater.Res.Soc.Proc.199,Pittsbuigh,PA,1990),p.205.Google Scholar
5.Ishitani, T. and Yaguchi, T.,Microscopy Res.and Tech.,35,320(1996)Google Scholar
6.Clarke, D.R.,Kroll, M.C.,Kirchner, P.D., and Cook, R.F.,Phys.Rev.Lett.,60,2156(1988).Google Scholar
7.Callahan, D.L. and Morris, J.C.,J.Mater.Res.,7,1614(1992).Google Scholar
8.Suzuki, T. and Ohmura, T.,Phil.Mag.A,74,1073(1996).Google Scholar
9.Saka, H.,Nagaya, G.,Sakuishi, T.,Abe, S. and Muroga, A.,in Fratu stability Dynamics.Sc ling.and Ductile/Brittle Behavior, editd by Blumberg, R.L. et al. (Mater.Res.Soc.Proc.409,Pittsburgh,PA, 1996),p.45.Google Scholar
10.Saka, H. and Abe, S.,J.Electron Microsc.,1,45(1997).Google Scholar