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Stokes/Anti-Stokes Raman Microprobe Analysis of Laser-Heated Silicon Microstructures on Silicon Dioxide

Published online by Cambridge University Press:  26 February 2011

Gregory D. Pazionis ,
Hua Tang ,
Lei Ge  and
Irving P. Herman
Gregory D. Pazionis
Affiliation:
Columbia University, Department of Applied Physics, New York, NY 10027
Hua Tang
Affiliation:
Columbia University, Department of Applied Physics, New York, NY 10027
Lei Ge
Affiliation:
Columbia University, Department of Applied Physics, New York, NY 10027
Irving P. Herman
Affiliation:
Columbia University, Department of Applied Physics, New York, NY 10027
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Abstract

Temperatures of laser-heated silicon microstructures on fused silica were determined by Stokes/anti-Stokes scattering using the 4880Å and 5145Å argon-ion laser lines, either separately or together to heat and probe the structure. Phonon shifts and broadening gave consistent measurements of temperature. Evaluation of temperatures from the ratio of Stokes/anti-Stokes intensities was shown to be sensitive to the details of scattering, collection, and detection.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 101: Symposium B – Laser and Particle-Beam Chemical Processing for Microelectronics , 1987 , 113
Copyright
Copyright © Materials Research Society 1998

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References

REFERENCES

1 Magnotta, F. and Herman, I. P., Appl. Phys. Lett. 48, 195 (1986).Google Scholar
2 Jellison, G. E. Jr., Lowndes, D. H., and Wood, R. F., Phys. Rev. B28, 3272 (1983).Google Scholar
3 Compaan, A. and Trodahl, H. J., Phys. Rev. B29, 793 (1984).Google Scholar
4 Jellison, G. E. Jr. and Modine, F. A., Appl. Phys. Lett. 41, 180 (1982).Google Scholar
5 Balkanski, M., Wallis, R. G., and Haro, E., Phys. Rev. B28, 1928 (1983).Google Scholar
6 Pazionis, G. D., Tang, H., and Herman, I. P. (in preparation).Google Scholar
7 Piglmayer, K., Doppelbauer, J., and Bauerle, D., in Laser-Controlled Chemical Processing of Surfaces--MRS Vol. 29, edited by Johnson, A. W., Ehrlich, D. J., and Schlossberg, H. R. (North Holland, New York, 1984), p.47.Google Scholar