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Real-Time Studies of The Electrocrystallization of Nanoscale Ceramic Superlattices

Published online by Cambridge University Press:  15 February 2011

Teresa D. Golden
Affiliation:
Graduate Center for Materials Research, University of Missouri - Rolla, Rolla, Missouri, 65401
Richard J. Phillips
Affiliation:
Graduate Center for Materials Research, University of Missouri - Rolla, Rolla, Missouri, 65401
Jay A. Switzer
Affiliation:
Graduate Center for Materials Research, University of Missouri - Rolla, Rolla, Missouri, 65401
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Abstract

Electrodeposition is unique among thin film deposition techniques, since the current following a potential step from open circuit to a given overpotential (i.e., driving force) provides a real-time, in situ probe of the deposition process. We have used current-time transients to determine the kinetics and dimensionality of growth, and to calculatethe composition profiles of electrodeposited superlattices in the Pb-TI-O system. The transients are indicative of 2D growth, and the height of the 2D monolayer depends on the orientation of the film. A [100] oriented film has a step height of 0.13 nm and a [210] oriented film has a step height of 0.18 nm. These heights correspond to the (400) and (220) d-spacings, respectively. Using a Cottrell analysis, we were able to both calculate and tailor the composition profile in these superlattices. Superlattices grown by pulsing between 70 and 150 mV have square profiles, while those grown by pulsing between 70 and 230 mV have graded profiles.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

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References

REFERENCES

1. Tench, D. and White, J., Metall. Trans. A 15, 2039 (1984).Google Scholar
2. Switzer, J. A., Shane, M. J., and Phillips, R. J., Science 247, 444 (1990).Google Scholar
3. Switzer, J. A. and Golden, T. D., Adv. Mater. 5, 474 (1993).Google Scholar
4. Golden, T. D., Raffaelle, R. P., and Switzer, J. A., Appl. Phys. Lett. 63, 1501 (1993).Google Scholar
5. Switzer, J. A., Hung, C. -J., Breyfogle, B. E., Shumsky, M. G., Leeuwen, R. Van, and Golden, T. D., Science 264, 1573 (1994).Google Scholar
6. Lashmore, D. S. and Dariel, M. P., J. Electrochem. Soc. 135, 1218 (1988).Google Scholar
7. Ross, C. A., Annu. Rev. Mater. Sci. 24, 159 (1994).Google Scholar
8. Feenstra, R. M., Collins, D. A., Ting, D. Z. -Y., Wang, M. W., and McGill, T. C., J. Vac. Sci. Technol. B 12, 2592 (1994).Google Scholar
9. Switzer, J. A., Raffaelle, R. P., Phillips, R. J., Hung, C. -J., and Golden, T. D., Science 258, 1918 (1992).Google Scholar
10. Phillips, R. J., Shane, M. J., and Switzer, J. A., J. Mater. Res. 4, 923 (1989).Google Scholar
11. Switzer, J. A., Phillips, R. J., and Golden, T. D., Appl. Phys. Lett. 66, 819 (1995).Google Scholar
12. MacDonald, D. D., in Transient Techniques in Electrochemistry, (Plenum Press, 1977), Ch. 8.Google Scholar