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Epitaxial Phase Change Materials: Growth and Switching of Ge2Sb2Te5 on GaSb(001)

Published online by Cambridge University Press:  31 January 2011

Wolfgang Braun
Affiliation:
braun@pdi-berlin.de, Paul-Drude Institute for Solid State Electronics, Berlin, Germany
Roman Shayduk
Affiliation:
shayduk@pdi-berlin.de, Paul-Drude Institute for Solid State Electronics, Berlin, Germany
Timur Flissikowski
Affiliation:
flissi@pdi-berlin.de, Paul-Drude Institute for Solid State Electronics, Berlin, Germany
Holger T. Grahn
Affiliation:
htgrahn@pdi-berlin.de, Paul-Drude Institute for Solid State Electronics, Berlin, Germany
Henning Riechert
Affiliation:
riechert@pdi-berlin.de, Paul-Drude Institute for Solid State Electronics, Berlin, Germany
Paul Fons
Affiliation:
paul-fons@aist.go.jp, National Institute of Advanced Industrial Science and Technology, Center for Applied Near-Field Optics Research, Tsukuba, Japan
Alex Kolobov
Affiliation:
a.kolobov@aist.go.jp, National Institute of Advanced Industrial Science and Technology, Center for Applied Near-Field Optics Research, Tsukuba, Japan
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Abstract

Epitaxial Ge2Sb2Te5 has been successfully grown on GaSb(001) by molecular beam epitaxy. The films show a tendency for void formation and rough morphology, but at the same time a very strong epitaxial orientation, cubic structure and a sharp interface to the substrate. The layers can be reversibly switched between the crystalline and amorphous phases using short laser pulses.

Type
Research Article
Copyright
Copyright © Materials Research Society 2009

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