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Materials For Laser-Plasma X-Ray Source Targets Applicable To Lithography

Published online by Cambridge University Press:  15 February 2011

M. Chaker ,
J.F. Pelletier  and
J.C. Kieffer
M. Chaker
Affiliation:
INRS-Énergie et Matériaux, 1650 Montée Ste-Julie, Varennes, Québec, Canada, J3X 1S2
J.F. Pelletier
Affiliation:
INRS-Énergie et Matériaux, 1650 Montée Ste-Julie, Varennes, Québec, Canada, J3X 1S2
J.C. Kieffer
Affiliation:
INRS-Énergie et Matériaux, 1650 Montée Ste-Julie, Varennes, Québec, Canada, J3X 1S2
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Abstract

In recent years, several X-ray lithography experiments involving laser plasma sources have been reported. The high X-ray conversion efficiency (η – 10%) in the keV range observed in various laboratories, using high laser intensities (I > 5 × 1012 W cm−2), has already made these sources an attractive alternative to the electron storage rings for X-ray lithography in proximity printing (XRL). In addition, X-rayproduction in the region around 130 Å has also been investigated at intensities of about 1011 W cm−2 for applications to X-ray Projection Lithography (XRPL). Conversion efficiency up to 1% into a 3 Å bandwidth has been demonstrated. In principle, a large variety of X-ray spectra can be obtained from a laser plasma source depending on the laser-target parameters. However, high conversion efficiencies, in a given spectral range, can only be achieved under specific plasma conditions (target atomic number, plasma temperature, plasma volume and spatio-temporal expansion...). This leads to some restrictions in possible target materials and irradiation conditions (laser wavelength, laser intensity, pulse duration). In this paper, we will discuss this physical aspect basing our analysis on both the theoretical and experimental studies of the X-ray spectra in different X-ray energy ranges and for various target atomic numbers. In addition, we will examine issues related to the laser plasma X-ray source design for both XRL and XRPL applications.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 306: Symposium K – Materials Aspects of X-Ray Lithography , 1993 , 151
Copyright
Copyright © Materials Research Society 1993

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