Results concerning the calibration and use of a new ultrahigh
vacuum (UHV) surface preparation and analysis system are reported.
This Sample Preparation Evaluation Analysis and Reaction (SPEAR)
side chamber system replaces an older surface side chamber that
was attached to a Hitachi UHV H-9000 microscope. The system
combines the ability to prepare clean surfaces using sample
heating, cooling, ion milling, or thin film growth with surface
analytical tools such as Auger electron spectroscopy (AES),
X-ray photoelectron spectroscopy (XPS), and scanning electron
microscopy (SEM), along with atomic surface structure information
available from high-resolution transmission electron microscopy
(HREM). The chemical sensitivity of the XPS and AES are
demonstrated in preliminary studies of catalytic and semiconductor
samples. In addition, the surface preparation capabilities are
also demonstrated for the Si(100) and Ge(100) surfaces, including
the ability to acquire secondary electron images during milling.
During operation, the entire system is capable of maintaining
the UHV conditions necessary for surface studies.