Heterogeneous gas–solid catalyst reactions occur at the atomic level, and understanding and controlling complex catalytic reactions at this level is crucial for the development of improved processes and materials. There are postulations that single atoms and very small clusters can act as primary active sites in chemical reactions. Early applications of our novel aberration-corrected (AC) environmental (scanning) transmission electron microscope (E(S)TEM) with single-atom resolution are described. This instrument combines, for the first time, controlled operating temperatures and a continuous gas environment around the sample with full AC STEM capabilities for real-time in situ analysis and visualization of single atoms and clusters in nanoparticle catalysis. ESTEM imaging and analysis in controlled gas and temperature environments can provide unique insights into catalytic reaction pathways that may involve metastable intermediate states. Benefits include new knowledge and more environmentally friendly technological processes for health care and renewable energy as well as improved or replacement mainstream technologies in the chemical and energy industries.

Advances in atomic-resolution environmental transmission electron microscopy (ETEM) and related techniques for probing gas–solid reactions in situ are described. The capabilities of ETEM allow the dynamic nanostructure of heterogeneous catalysts in their functioning states to be directly monitored in real time. Applications of ETEM in catalysis are outlined, and they illustrate significant new insights into the dynamic nanostructure of the catalyst materials and their modes of operation.

Highlights of our pioneering development of atomic resolution in situ environmental transmission electron microscope (ETEM) for direct probing of gas-solid reactions and in situ nanosynthesis are described. Dynamic studies on supported nanoparticle catalysts and carbon nanotubes under different reaction environments have been carried out. The results provide deep insights into the dynamic nanostructure of the materials and their mode of operation.

We present a novel process methodology for the controlled cutting of nanotubes and other nanostructures to well-controlled lengths and sizes. The continuing increase in complexity of electronic devices, coupled with decreasing size of individual elements, are placing more stringent demands on the resolution and accuracy of fabrication patterns. The ability to fabricate on a nanometer scale guarantees a continuation in miniaturization of functional devices. Particularly interesting is the application of nanotubes' chemical and electronic properties which vary with their dimensions and structure. One realization of this process includes the use of photolithography or electron beam lithography to place protective resist patterns over the nanostructures to be cut. Those sections which are not covered by the resist pattern are removed by reactive ion etching. This is a scaleable process which permits the simultaneous cutting of many nanostructures and ensembles of nanostructures. The lengths, shapes or length distributions can be predicted from theory and thus specified for a given application requirement. Nanostructures which can be cut in this process include nanotubes, nanofibers and nanoplanes. Large scale production of nanostructures with uniform length or specific size-distribution can be used in electronic applications such as field-emission transistors, optoelectronic elements, single electron devices and sensors.