10 results
Enhanced Morphological and Thermal Stabilities of Nickel Germanide with an Ultrathin Tantalum Layer Studied by Ex Situ and In Situ Transmission Electron Microscopy
-
- Journal:
- / Volume 19 / Issue S5 / August 2013
- Published online by Cambridge University Press:
- 06 August 2013, pp. 114-118
- Print publication:
- August 2013
-
- Article
- Export citation
Effects of the microstructure of ZnO seed layer on the ZnO nanowire density
-
- Journal:
- Journal of Materials Research / Volume 26 / Issue 10 / 28 May 2011
- Published online by Cambridge University Press:
- 16 May 2011, pp. 1292-1297
- Print publication:
- 28 May 2011
-
- Article
- Export citation
Effects of the pyromellitic dianhydride cathode interfacial layer on characteristics of organic solar cells based on poly(3-hexylthiophene-2,5-diyl) and [6,6]-phenyl C61 butyric acid methyl ester
-
- Journal:
- Journal of Materials Research / Volume 25 / Issue 5 / May 2010
- Published online by Cambridge University Press:
- 31 January 2011, pp. 866-870
- Print publication:
- May 2010
-
- Article
- Export citation
A study on materials interactions between Mo electrode and InGaZnO active layer in InGaZnO-based thin film transistors
-
- Journal:
- Journal of Materials Research / Volume 25 / Issue 2 / February 2010
- Published online by Cambridge University Press:
- 31 January 2011, pp. 266-271
- Print publication:
- February 2010
-
- Article
- Export citation
Characterization of oxygen and nitrogen rapid thermal annealing processes for ultra-low-k SiCOH films
-
- Journal:
- Journal of Materials Research / Volume 23 / Issue 3 / March 2008
- Published online by Cambridge University Press:
- 31 January 2011, pp. 856-861
- Print publication:
- March 2008
-
- Article
- Export citation
Area Selective Atomic Layer Deposition by Soft Lithography
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 917 / 2006
- Published online by Cambridge University Press:
- 01 February 2011, 0917-E11-05
- Print publication:
- 2006
-
- Article
- Export citation
Comparative Study on Electrical and Microstructural Characteristics of ZrO2 and HfO2 Grown by Atomic Layer Deposition
-
- Journal:
- Journal of Materials Research / Volume 20 / Issue 11 / November 2005
- Published online by Cambridge University Press:
- 03 March 2011, pp. 3125-3132
- Print publication:
- November 2005
-
- Article
- Export citation
Oxygen Permeability of Ferroelectric Thin Film Top Electrodes and Its Effect on Detectable Fatigue Cycling-Induced Oxygen Isotope Motion
-
- Journal:
- Journal of Materials Research / Volume 19 / Issue 4 / April 2004
- Published online by Cambridge University Press:
- 03 March 2011, pp. 1265-1272
- Print publication:
- April 2004
-
- Article
- Export citation
Microstructural evolution of ZrO2–HfO2 nanolaminate structures grown by atomic layer deposition
-
- Journal:
- Journal of Materials Research / Volume 19 / Issue 2 / February 2004
- Published online by Cambridge University Press:
- 03 March 2011, pp. 643-650
- Print publication:
- February 2004
-
- Article
- Export citation
Controlling Area-Selective Atomic Layer Deposition of HfO2 Dielectric by Self-assembled Monolayers
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 811 / 2004
- Published online by Cambridge University Press:
- 28 July 2011, D3.3
- Print publication:
- 2004
-
- Article
- Export citation