A quantitative analysis of In concentration in InGaN/GaN multiquantum wells in light-emitting diodes was carried out using high-resolution transmission electron microscopy (HRTEM) and high-angle annual dark-field scanning TEM (HAADF-STEM). The In composition in InGaN was evaluated by the precise measurement of c-lattice parameters in the HRTEM micrographs, which increase with increasing In composition. The reliability of the results was confirmed by high-resolution x-ray diffraction measurements and Rutherford backscattering spectrometry. Quantitative In compositions can, therefore, be determined using HRTEM. We tried to determine the quantitative In compositions in InGaN by analyzing the intensity profiles of the HAADF-STEM images. However, several problems were encountered, such as differences in the thickness of the region observed, carbon contamination, and ion beam damage during specimen preparation. Therefore, relative differences in composition were observed in the HAADF-STEM images.

We conducted community interviews and field surveys to determine the distribution and population of the Endangered Shortridge's capped langur Trachypithecus shortridgei, and the threats to the species, in the Dulong and Nu River valleys of north-western Yunnan Province, China. We found that c. 19 groups of T. shortridgei reside in the Dulong valley, mostly located in the southern portion of the valley. According to interview and observational records in the Gaoligong Mountains to the west of the Nu River, 12 individuals and no groups were observed. Family groups consist of one adult male, 2–3 adult females and up to five young. We estimate the population of T. shortridgei in China to be c. 250–370 individuals. Threats to the species include habitat loss and poaching. We suggest several measures to conserve T. shortridgei, such as a review of the Gaoligong National Nature Reserve management strategy, and increasing engagement, education, inclusion of local people in forest management, and the consistency of enforcement.

The growth of high-quality indium (In)-rich InXGa1−XN alloys is technologically important for applications to attain highly efficient green light-emitting diodes and solar cells. However, phase separation and composition modulation in In-rich InXGa1−XN alloys are inevitable phenomena that degrade the crystal quality of In-rich InXGa1−XN layers. Composition modulations were observed in the In-rich InXGa1−XN layers with various In compositions. The In composition modulation in the InXGa1−XN alloys formed in samples with In compositions exceeding 47%. The misfit strain between the InGaN layer and the GaN buffer retarded the composition modulation, which resulted in the formation of modulated regions 100 nm above the In0.67Ga0.33N/GaN interface. The composition modulations were formed on the specific crystallographic planes of both the {0001} and {0114} planes of InGaN.

In the thin film transistor fabrication process, tin doped indium oxide (ITO) or zinc doped indium oxide (IZO) film can be easily exposed to hydrogen-containing plasma during the deposition of silicon nitride (SiNx) film. By this exposure, ITO or IZO can be easily reduced into its corresponding metallic element such as indium, which degrades the optical transmittance and the conductivity. In this study, SiNx was deposited onto ITO or IZO film, and the oxygen reduction of ITO or IZO during PECVD SiNx deposition was analyzed to clarify this phenomenon. The oxygen reduction during PECVD SiNx deposition is mainly induced by decomposed NH3 gas. However, the progress of ITO reduction is different from that of IZO reduction, due to the different atomic composition of In2O3 in the composite and the different critical temperature of reduction initiation between indium oxide, tin oxide, and zinc oxide.