3 results
Roughness evolution of high-rate deposited a-SiNx:H films studied by atomic force microscopy and real time spectroscopic ellipsometry
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- Journal:
- MRS Online Proceedings Library Archive / Volume 808 / 2004
- Published online by Cambridge University Press:
- 21 March 2011, A9.35
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- 2004
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The a-Si:H Growth Mechanism: Temperature Study of the SiH3 Surface Reactivity and the Surface Silicon Hydride Composition During Film Growth
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- Journal:
- MRS Online Proceedings Library Archive / Volume 762 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, A9.3
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- 2003
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High-rate a-Si:H and μc-Si:H Film Growth Studied by Advanced Plasma and in situ Film Diagnostics
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- Journal:
- MRS Online Proceedings Library Archive / Volume 715 / 2002
- Published online by Cambridge University Press:
- 01 February 2011, A25.6
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- 2002
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