The multilayers of ferroelectric (FE) Pb(Zr, Ti)O3 (PZT) and ferromagnetic (FM) CoFe2O4 (CFO) thin films with 3, 5, and 9 layers having configurations PZT/CFO (PC) and CFO/PZT (CP) were fabricated by pulsed laser deposition technique. We have investigated the effect of inter-diffusion at the interface of multilayers (MLs) and reversing the order of FE and FM layers in the multilayers configuration on the electrical/magnetic properties. The TEM of the films showed that the layer structure was not maintained and the inter-diffusion of the CFO into PZT and vice verse were observed at the interface of MLs. Both the PC and CP configurations of multilayer films exhibited pseudo FE hysteresis loop and proper FM hysteresis loops at room temperature. Reversing the multilayer configuration from CP to PC resulted in increasing the pseudo remanent polarization, however this behavior was not observed in magnetic properties. The frequency and temperature dependences of the impedance and modulus spectroscopy of the multilayer PC and CP films were studied in the ranges of 102 to 106 Hz and 200 to 650 K respectively. The electrical response of all multilayer films investigated could be resolved into two contributions. We attributed these to the grain and grain boundary effects in impedance and modulus formalism. We found that the difference between the grain and grain boundary capacitive effect decreased due to increase of the number of layers.

Average Li intercalation potentials were calculated for lithium-4d-transition-metal-oxides. The effect on the intercalation voltage of metal substitution was systematically studied by altering the 4d transitional metals M (M= Mo, Nb, Rh, Zr, Ru) in LiMO2 in the α-NaFeO2 structure. Lattice parameters in the layered α-NaFeO2 structure computed in the GGA approximation are in reasonable agreement with experiment. The intercalation potentials and relative formation energies of the fully lithiated LiNi1/3Mn1/3Mo1/3O2, fully delithiated Ni1/3Mn1/3Mo1/3O2 and the intermediate phases, Li1/3Ni1/3Mn1/3Mo1/3O2 and Li2/3Ni1/3Mn1/3Mo1/3O2, were computed by employing a generalized alloy theory. A minute substitution of cationic Mo in LiNiMnO2 was experimentally investigated to examine the effect of the Mo substitution on the electrochemical properties.

Thin films of Ba1-x SrxTiO3 (BST) are being actively investigated for applications in dynamic random access memories (DRAM) because of their properties such as high dielectric constant, low leakage current, and low fatigue. Several approaches have been used to improve the properties of thin films such as doping with aliovalent dopants, graded compositions, and layered structures. We have found that interposing layers of an electronic insulator such as ZrO2 in between BST layers results in a significant reduction in the leakage current. In this paper the low temperature electrical properties of these multilayer structures are reported. The structures consist of alternate layers of Ba0.8Sr0.2TiO3 and ZrO2 deposited by a sol-gel process on platinized Si substrates. The thickness and the number of layers are varied while keeping the total thickness of the film constant. Multiple peaks in the dielectric constant vs temperature plots at all frequencies are observed in the multilayered films. The properties of the multilayer films are a complex function of the number of layers and their thicknesses. A structure with several thin layers of ZrO2 interposed between the BST layers produces smoother plots than a single layer of ZrO2 of same total thickness. This is attributed to more uniform distribution, as determined by XPS, of ZrO2 in the multilayer structure due to smaller diffusion distances.

Ferroelectric thin films of BaZrxTi1-xO3 (BZT) were deposited on platinum (Pt) and platinized silicon (Pt/Si) substrates by sol-gel and pulse laser deposition technique respectively. The structure and preferred orientation of the films were examined by x-ray diffraction measurements. The phase formation of sol-gel derived BZT films were found to be at high temperature (1100°C) compare to the pulse laser deposited BZT films ∼ 700°C. Polycrystalline films were observed by both techniques. Ferroelectric nature of the films was confirmed by hysteresis and capacitance-voltage characteristics using platinum top electrodes. Dielectric constant as well as loss was found to decrease by increasing Zr contents. Surface morphology predicted smooth crack free surface.

In this work we present the structural, and vibrational properties of ferroelectric Pb1-xSrxTiO3 (PST). Thin films of PST were prepared by using sol-gel technique for various compositions with x values ranging from 0.0–1.0. Respective compositions were also prepared in ceramic and powder forms using sol-gel and solid-state reaction methods. X-ray diffraction was used for the structural characterization of these materials. Raman spectroscopy was utilized to study the phases and lattice vibrational modes, especially the soft mode in PST compositions. The temperature dependence of the soft mode frequency for different PST compositions revealed that the phase transition temperatures increased with increasing Pb contents in PST system. Ferroelectric properties of the films were correlated with the substitution-induced changes in the material.

In the present work we have deposited MgO and Ba0.5Sr0.5TiO3 (BST50) thin layers in different sequences to make MgO:BST50 hetero-structured thin films. These films were characterized by X-ray diffraction and found to be highly (100) textured. The figure of merit {(C0-Cv)/(C0.tand)} of the hetero-structured films was found to be higher as compared to pure BST50 films measured at 1 MHz frequency with electric field of 25.3 kV/cm. These films were used to make eight element coupled micro-strip phase shifter and characterized in a frequency range of 13–15 GHz. The high frequency figure of merit (k factor, defined as the ratio of degree of phase shift per dB loss) measured at around 14 GHz with electric field of 333 kV/cm has been markedly improved (around 64.28 °/dB for hetero-structured film as compared to 24.65 °/dB for pure film). Improvement in dielectric properties in a wide frequency range in the MgO:BST are believed to be due to the higher densification of the hetero-structured films.

Temperature dependent dielectric behavior of sol-gel derived ferroelectric Pb1−xLaxTiO3 (PLT) (x = 0.05 to 0.30) thin films on Pt/Si substrates has been studied. The characteristics of the diffuse phase transition and possible relaxor behavior of PbTiO3 thin films doped with different amounts of La are investigated. Room temperature X-ray and micro Raman results indicate that the crystal structure of the PLT films was strongly influenced by the La content. The softening of the E(1TO) mode with increasing La content indicates that the incorporation of La in the PT lattice results in a structural disorder in the material. The dielectric permittivity and loss tangent of the PLT thin films were measured in the temperature range of 80 –700 K at frequencies between 1 kHz and 1 MHz. Transition temperatures (Tm) for PLT (x = 0.05, 0.20, and 0.30) are 640, 460, and 254 K respectively, and are higher in comparison to reported values of bulk ceramics. The permittivity maximum broadened, and showed relaxor- type frequency dependent permittivity characteristics for PLT (x = 0.30) films. The broadening parameter was significantly influenced by La doping and our results indicate that PLT thin films undergo a normal-to-relaxor ferroelectric transformation for La concentrations of 25 at% in PLT films.

Sol-Gel derived Pb0.85La0.15TiO3 PLT15) thin films were deposited on solution derived RuO2/Si, RuO2/Pt/Si and Pt bottom electrodes. Dielectric, tangent loss, hysteresis, J-E, measurements were also carried out on these films. X-ray results established the single phase perovskite formation with no secondary phases of PLT15 thin film on these electrodes. PLT15 thin films on RuO2 bottom electrode showed relatively inferior ferroelectric and dielectric behavior as compared to Pt electrode. Low leakage currents (10-8 A/cm2 at 10 kV/cm) and the observed J-E characteristics have been attributed to poor film-electrode interface. Observed electrical and dielectric properties have been correlated with the film-electrode interface. The interface characteristics were further augmented by depth profile analysis using Auger Electron Spectroscopy.

Ruthenium Oxide (RuO2) thin films were prepared on silicon substrates by solution chemistry technique. X-ray Diffraction (XRD), Atomic Force Microscopy (AFM), micro-Raman, X-ray photoelectron spectroscopy (XPS), and four probe Van-der-paw technique were used for the film characterization. X-ray analysis shows a rutile structure in these films. The films annealed at 700°C showed lowest resistivity of 29 × 10−5 ohm-cm. The presence of Eg, A1g, and B2g modes is consistent with the Raman spectrum of rutile phase. These modes as well as additional unidentified band at about 477 cm−1 were investigated by temperature dependent Raman studies. Based on the result, band at 477 cm−1 that disappears above 370 K is attributed to hydrated RuO2 present in the films. XPS analysis show stoichiometric rutile RuO2 present in the films. Small concentrations of RuCl3, RuO3 and hydrated RuO2 were also detected. Pb0.9La0.15TiO3 (PLT15) thin films were deposited on RuO2/Si substrates and characterized for its ferroelectric properties to demonstrate that solution deposition technique offers an alternative approach for preparing high quality RuO2 bottom electrodes.

In the present work we have studied the characteristics of Pb1.05-xLaxTil-x/4O3 ( x= 0 to 30 at%) thin films prepared by acetic acid and methoxy-ethanol based sol-gel techniques. We have found that higher intermediate temperature fired films (x=0.15), prepared by acetic acid modified technique yielded (100) textured growth with improved dielectric properties. It has been argued that homogeneous mixing of the film constituents in the sol is influenced by the choice of the precursor materials and preparation methodology which in turn controls the growth characteristics and electrical properties. Lanthanum as a dopant has a pronounced influence on the structure, microstructure and electrical properties of the deposited films. In the Raman spectra, the soft E(1TO) phonon shifts towards the lower frequency with a sharp decrease in its intensity and a tetragonal to cubic structural transformation (for 26.5 at % La) was observed at room temperature. In the ferroelectric composition range (up to 15 at % La doping), we have observed a significant improvement of ferroelectric properties with the La addition.

In the present work we have optimized the process parameters to yield homogeneous, smooth ruthenium oxide (RuO2) thin films on silicon substrates by a solution deposition technique using RuCl3.×.H2O as the precursor material. Films were annealed in a temperature range of 300°C to 700°C, and it was found that RuO2 crystallizes at a temperature as low as 400°C. The crystallinity of the films improves with increased annealing temperature and the resistivity decreases from 4.86µΩ-m (films annealed at 400°C) to 2.94pµΩ (films annealed at 700°C). Ageing of the precursor solution has a pronounced effect on the measured resistivities of RuO2 thin films. It was found that the measured room temperature resistivities increases from 2.94µΩ-m to 45.7µΩ-m when the precursor sol is aged for aged 60 days. AFM analysis on the aged films shows that the grain size and the surface roughness of the annealed films increase with the ageing of the precursor solution. From XPS analysis we have detected the presence of non-transformed RuCl3 in case of films prepared from aged solution. We propose, that solution ageing inhibits the transformation of RuCl3 to RuO2 during the annealing of the films. The deterioration of the conductivity with solution ageing is thought to be related with the chloride contamination in the annealed films.

A PbTiO3 thin film prepared on silicon substrate by sol-gel technique has been studied by micro-Raman spectroscopy. The spectra, in comparison to the single crystal work, show high background in the low frequency region and Raman lines are broader, thus revealing the polycrystalline nature of the film. The frequencies of the Raman bands in the film are clearly shifted to lower frequencies compared to the corresponding ones in the single crystal or powder forms. This phenomenon is similar to the hydrostatic pressure effect on the Raman lines of PbTiO3 single crystal. The film, therefore, has grains under stress. This stress is caused by non-equilibrium defects and diffusion at the interface. Measurements at different film positions showed variation in the frequency and width of the Raman bands which are associated with the stress and grain size inhomogeneities. The measured shift in the Raman frequencies suggest grain sizes ≤l μm. XRD indicates grain size around 22 nm.