CrSi2 is of technological interest because it is a silicon-based semiconductor with a small band gap. Due to the lack of success with conventional molecular beam epitaxy of CrSi2 on Si, growth on mesotaxy-produced template layers and allotaxy have been attempted. After removal of the Si capping layer, epitaxy of additional CrSi2 on template layers formed by mesotaxy was found to be possible. However, single-crystal continuous films were not obtained, due at least in part to the presence of a network of cracks in the starting template. Allotaxy of CrSi2 was found to allow the formation of large grains of CrSi2 embedded in a single-crystal Si matrix, but coalescence of these grains into a continuous layer was not achieved.