We use cookies to distinguish you from other users and to provide you with a better experience on our websites. Close this message to accept cookies or find out how to manage your cookie settings.
We use cookies to distinguish you from other users and to provide you with a better experience on our websites. Close this message to accept cookies or find out how to manage your cookie settings.
When a less-viscous solution of a reactant 
$A$ displaces a more-viscous solution of another reactant 
$B$, a fast bimolecular 
$A + B \rightarrow C$ reaction decreasing locally the viscosity can influence the viscous fingering (VF) instability taking place between the two miscible solutions. We show both experimentally and numerically that, for monotonic viscosity profiles, this decrease in viscosity has opposite effects on the fingering pattern depending on the injection flow rate. For high flow rates, the reaction enhances the shielding effect, creating VF patterns with a lower surface density, i.e. thinner fingers covering a smaller area. In contrast, for lower flow rates, the reaction stabilises the VF dynamics, i.e. delays the instability and gives a less-deformed displacement, reaching in some cases an almost-stable displacement. Nonlinear simulations of reactive VF show that these opposite effects at low or high flow rates can only be reproduced if the diffusivity of 
$A$ is larger than that of 
$B$, which favours a larger production of the product 
$C$ and, hence, a larger viscosity decrease. The analysis of one-dimensional viscosity profiles reconstructed on the basis of a one-dimensional reaction–diffusion–advection model confirms that the VF stabilisation at low Péclet number and in the presence of differential diffusion of reactants originates from an optimum reaction-driven decrease in the gradient of the monotonic viscosity profile.
The magnetohydrodynamic stability of plasmas with an anisotropic pressure component is analysed for a low magnetic field configuration of the large helical device. Magnetic equilibria are calculated by the anisotropic Neumann inverse moments equilibrium code, an extension of the three-dimensional variational moments equilibrium code. A modified version of the bi-Maxwellian is used to model the anisotropic particle velocity distribution. Magnetohydrodynamic stability calculations for the $n=1$
mode family are carried out by TERPSICHORE, which has been expanded by the Kruskal–Oberman energy principle. For on-axis particle deposition, the growth rate and plasma displacement show that the parallel dominant plasmas are significantly more stable than isotropic or perpendicular dominant plasmas. For off-axis particle deposition, the growth rate and the Mercier criterion in the peripheral region $\rho =0.9$
, show that low field (LF) deposition perpendicular dominant plasmas are most unstable. For the most realistic off-axis deposition profile, it is found that parallel dominant plasmas are most stable for LF deposition, while perpendicular dominant plasmas are most stable for high field deposition. We conclude that, under low magnetic field conditions in the large helical device, tangential neutral beam injection heating has a stabilising influence on the plasma.
