Hostname: page-component-848d4c4894-m9kch Total loading time: 0 Render date: 2024-06-01T16:21:16.626Z Has data issue: false hasContentIssue false
  • English
  • Français

Analysis of residual stresses in diamond coatings deposited on cemented tungsten carbide substrates

Published online by Cambridge University Press:  03 March 2011

Zhenqing Xu ,
Leonid Lev ,
Michael Lukitsch  and
Ashok Kumar
Zhenqing Xu
Affiliation:
Department of Mechanical Engineering, Nanomaterials and Nanomanufacturing Research Center, University of South Florida, Tampa, Florida 33620
Leonid Lev
Affiliation:
R&D Center, General Motors Corporation, Warren, Michigan 48090
Michael Lukitsch
Affiliation:
R&D Center, General Motors Corporation, Warren, Michigan 48090
Ashok Kumar*
Affiliation:
Department of Mechanical Engineering, Nanomaterials and Nanomanufacturing Research Center, University of South Florida, Tampa, Florida 33620
*
a) Address all correspondence to this author. e-mail: akumar@eng.usf.edu
Get access

Abstract

Residual stresses in diamond films grown on WC–Co substrates have been investigated by Raman spectroscopy, x-ray diffraction (XRD), and curvature methods. Microcrystalline diamond films were deposited at 650–700 °C in a conventional hydrogen–methane environment by the microwave plasma-enhanced chemical vapor deposition technique. The film thickness, measured from cross-sectional micrographs taken by scanning electron microscopy, changed from 1.5 to 16.5 μm as the growth time increased from 1 to 12 h. The type and the magnitude of the total residual stress obtained from curvature and XRD measurements agreed very well in all of the samples and changed from tensile to compressive as film thickness increased. However, Raman spectroscopy results showed that all films exhibited compressive stress due to the domain size effect. Different methane fractions, varying from 1% to 3%, have been utilized for diamond growth, and the total residual stress increased as more methane was included.

Keywords

Chemical vapor deposition (CVD)CoatingDiamond
Type
Articles
Information
Journal of Materials Research , Volume 22 , Issue 4 , April 2007 , pp. 1012 - 1017
Copyright
Copyright © Materials Research Society 2007

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1Murakawa, M. and Takeuchi, S.: Mechanical applications of thin and thick diamond films. Surf. Coat. Technol. 49, 359 (1991).CrossRefGoogle Scholar
2Leyendecker, T., Lemmer, O., Jurgens, A., Esser, S., and Ebberink, J.: Industrial application of crystalline diamond-coated tools. Surf. Coat. Technol. 48, 253 (1991).CrossRefGoogle Scholar
3Reineck, I., Soderberg, S., Ekholm, P., and Westergren, K.: Chemically vapor deposited diamond as a cutting tool material: A study of failure mechanisms. Surf. Coat. Technol. 57, 47 (1993).CrossRefGoogle Scholar
4Kanda, K., Takehana, S., Yoshida, S., Watanabe, R., Takano, S., Ando, H., and Shimakura, F.: Application of diamond-coated cutting tools. Surf. Coat. Technol. 73, 115 (1995).CrossRefGoogle Scholar
5Amirhaghi, S., Reehal, H.S., Wood, R.J.K., and Wheeler, D.W.: Diamond coatings on tungsten carbide and their erosive wear properties. Surf. Coat. Technol. 135, 126 (2001).CrossRefGoogle Scholar
6Nix, W.D. and Clemens, B.M.: Crystallite coalescence: A mechanism for intrinsic tensile stresses in thin films. J. Mater. Res. 14, 3467 (1999).CrossRefGoogle Scholar
7Windischmann, H. and Epps, G.F.: Intrinsic stress in diamond films prepared by microwave plasma CVD. J. Appl. Phys. 69, 2231 (1991).CrossRefGoogle Scholar
8Rats, D., Bimbault, L., Vandenbulcke, L., Herbin, R., and Badawi, K.F.: Crystalline quality and residual stresses in diamond layers by Raman and x-ray diffraction analyses. J. Appl. Phys. 78, 4994 (1995).CrossRefGoogle Scholar
9Windischmann, H. and Gray, K.J.: Stress measurement of CVD diamond films. Diamond Relat. Mater. 4, 837 (1995).CrossRefGoogle Scholar
10Stoney, G.G.: The tension of metallic films deposited by electrolysis. Proc. R. Soc. London A82, 172 (1909).Google Scholar
11Nemanich, R.J., Bergman, L., LeGrice, Y.M., Turner, K.F., and Humphreys, T.P.: Microstructures and domain size effects in diamond films characterized by Raman spectroscopy. Proc. SPIE-Int. Soc. Opt. Eng. 1437, 2 (1991).Google Scholar
12Raghuveer, M.S., Yoganand, S.N., Jagannadham, K., Lemaster, R.L., and Bailey, J.: Improved CVD diamond coatings on WC–Co tool substrates. Wear 253, 1194 (2002).CrossRefGoogle Scholar
13Ma, Z., Wang, J., Wu, Q., and Wang, C.: Adhesion improvement of diamond films on cemented carbides with copper implant layer. Thin Solid Films 390, 104 (2001).Google Scholar
14Ahmed, W., Sein, H., Ali, N., Gracio, J., and Woodwards, R.: Diamond films grown on cemented WC–Co dental burs using an improved CVD method. Diamond Relat. Mater. 12, 1300 (2003).CrossRefGoogle Scholar
15Xu, Z., Lev, L., Lukitsch, M., and Kumar, A.: Deposition of adherent diamond coatings on WC-Co substrates, in Surface Engineering for Manufacturing Applications edited by Bull, S.J., Chalker, P.R., Chen, S.C., Meng, W.J. and Maboudian, R. (Mater. Res. Soc. Symp. Proc. 890, Warrendale, PA, 2006), p. 0890-Y01-02.Google Scholar
16Xu, Z., Lev, L., Lukitsch, M., and Kumar, A.: Effects of surface pretreatments on the deposition of adherent diamond coatings on cemented tungsten carbide substrates. Diamond Relat. Mater. 17, 461 (2007).CrossRefGoogle Scholar
17Brenner, A. and Senderoff, S.: Calculation of stress in elctrodeposits from the curvature of a plated strip. J. Res. Natl. Bur. Stand. (US) 42, 105 (1949).CrossRefGoogle Scholar
18Buss, K. and Mari, D.: High temperature deformation mechanisms in cemented carbides and cermets studied by mechanical spectroscopy. Mater. Sci. Eng. 370A, 163 (2004).CrossRefGoogle Scholar
19Wirmark, G., Dunlop, G.L., and Chatfield, C.: Tensile creep of WC–Co cemented carbides at 800–900 °C. Int. J. Refract. Met. Hard Mater. 5, 153 (1986).Google Scholar
20Chowdhury, S., Laugier, M.T., and Henry, J.: XRD stress analysis of CVD diamond coatings on SiC substrates. Int. J. Refract. Met. Hard Mater. 25, 39 (2007).CrossRefGoogle Scholar
21Baranauskas, V., Ceragioli, H.J., Peterlevitz, A.C., and Fontana, M.: Low residual stress diamond coatings on titanium. Surf. Coat. Technol. 200, 2343 (2005).CrossRefGoogle Scholar
22Goudeau, P., Vandenbulcke, L., Met, C., De Barros, M.I., AndreAzza, P., Thiaudiere, D., and Gailhanou, M.: X-ray diffraction analysis of residual stresses in smooth fined-grain diamond coatings deposited on TA6V alloys. Surf. Coat. Technol. 200, 170 (2005).CrossRefGoogle Scholar
23Diniz, A.V., Ferreira, N.G., Corat, E.J., and Trava-Airoldi, V.J.: Micro-Raman spectroscopy for stress analysis on large area diamond/Ti6Al4V electrodes. Diamond Relat. Mater. 13, 526 (2004).CrossRefGoogle Scholar
24Azevedo, A.F., de Barros, R.C. Mens, Serrano, S.H.P., and Ferreira, N.G.: SEM and Raman analysis of boron-doped diamond coating on spherical textured substrates. Surf. Coat. Technol. 200, 2973 (2006).CrossRefGoogle Scholar
25Ferreira, N.G., Abramof, E., Corat, E.J., and Trava-Airoldi, V.J.: Residual stresses and crystalline quality of heavily boron-doped diamond films analyzed by micro-Raman spectroscopy and x-ray diffraction. Carbon 41, 1301 (2003).CrossRefGoogle Scholar
26Kim, J.G. and Yu, J.: Comparative study of residual stresses measurement methods on CVD diamond films. Scripta Mater. 39, 807 (1998).CrossRefGoogle Scholar
27Rajamani, A., Sheldon, B.W., Nijhawan, S., Schwartzman, A., Rankin, J., Walden, B.L., and Riester, L.: Chemistry-induced intrinsic stress variations during the chemical vapor deposition of polycrystalline diamond. J. Appl. Phys. 96, 3531 (2004).CrossRefGoogle Scholar