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Cold-Atom Ion Sources for Focused Ion Beam Applications

Published online by Cambridge University Press:  04 August 2017

J.J. McClelland ,
W.R. McGehee ,
V.P. Oleshko ,
C.L. Soles ,
S. Takeuchi ,
O. Kirilov ,
D. Gundlach ,
E. Strelcov ,
N. Zhitenev  and
T. Michels
...Show all authors
J.J. McClelland
Affiliation:
Center for Nanoscale Science and Technology
W.R. McGehee
Affiliation:
Center for Nanoscale Science and Technology
V.P. Oleshko
Affiliation:
Material Measurement Laboratory
C.L. Soles
Affiliation:
Material Measurement Laboratory
S. Takeuchi
Affiliation:
Physical Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, MD 20899USA Theiss Research, La Jolla, CA 92037, USA
O. Kirilov
Affiliation:
Physical Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, MD 20899USA
D. Gundlach
Affiliation:
Physical Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, MD 20899USA
E. Strelcov
Affiliation:
Center for Nanoscale Science and Technology Maryland Nanocenter, University of Maryland, College Park, MD 20742, USA
N. Zhitenev
Affiliation:
Center for Nanoscale Science and Technology
T. Michels
Affiliation:
Center for Nanoscale Science and Technology Ilmenau University of Technology, Ilemnau, Germany
V.A. Aksyuk
Affiliation:
Center for Nanoscale Science and Technology
A.V. Steele
Affiliation:
zeroK NanoTech, Gaithersburg, MD 20879USA
A. Schwarzkopf
Affiliation:
zeroK NanoTech, Gaithersburg, MD 20879USA
B. Knuffman
Affiliation:
zeroK NanoTech, Gaithersburg, MD 20879USA

Abstract

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Abstract
Information
Microscopy and Microanalysis , Volume 23 , Supplement S1: Proceedings of Microscopy & Microanalysis 2017 , July 2017 , pp. 276 - 277
Copyright
© Microscopy Society of America 2017 

References

[1] McClelland, J.J., Steele, A.V., Knuffman, B., Twedt, K.A., Schwarzkopf, A. & Wilson, T.M. Appl. Phys. Rev 3 2016). p 011302.CrossRefGoogle Scholar
[2] Steele, A. V., Knuffman, B., McClelland, J.J. & Orloff, J. J. Vac. Sci. Technol. B 28, C6F1 2010.CrossRefGoogle Scholar
[3] Knuffman, B., Steele, A.V., Orloff, J. & McClelland, J.J. New J. Phys. 13 2011). p 103035.CrossRefGoogle Scholar
[4] Debernardi, N., Reijnders, M.P., Engelen, W.J., Clevis, T.T.J., Mutsaers, P.H.A., Luiten, O.J. & Vredenbregt, E.J.D. J. Appl. Phys 110 2011). p 024501.CrossRefGoogle Scholar
[5] Knuffman, B., Steele, A.V. & McClelland, J.J. J. Appl. Phys 114 2013). p 044303.Google Scholar
[6] Viteau, M., Reveillard, M., Kime, L., Rasser, B., Sudraud, P., Bruneau, Y., Khalili, G., Pillet, P., Comparat, D., Guerri, I., Fioretti, A., Ciampini, D., Allegrini, M. & Fuso, F. Ultramicroscopy 164, 70 2016.CrossRefGoogle Scholar
[7] Twedt, K.A., Chen, L. & McClelland, J.J. Ultramicroscopy 142 2014). p 24.Google Scholar
[8] Takeuchi, S., McGehee, W.R., Schaefer, J.L., Wilson, T.M., Twedt, K.A., Chang, E.H., Soles, C.L., Oleshko, V.P & McClelland, J.J. J. Electrochem. Soc 163 2016). p A1010.Google Scholar
[9] Twedt, K.A., Zou, J., Davanco, M., Srinivasan, K., McClelland, J.J. & Aksyuk, V.A. Nature Photonics 10 2015). p 35.CrossRefGoogle Scholar