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Generating Large Magnetic Field in a High Resolution Electron Beam Lithography

Published online by Cambridge University Press:  23 September 2015

C.H. Wan
Affiliation:
Institute of Physics, Chinese Academy of Sciences, Beijing National Laboratory of Condensed Matter Physics, Beijing, 100190, Peoples Republic of China
P. Guo
Affiliation:
Institute of Physics, Chinese Academy of Sciences, Beijing National Laboratory of Condensed Matter Physics, Beijing, 100190, Peoples Republic of China
Q. T. Zhang
Affiliation:
Institute of Physics, Chinese Academy of Sciences, Beijing National Laboratory of Condensed Matter Physics, Beijing, 100190, Peoples Republic of China
A. Rudzinski
Affiliation:
Raith GmbH, Dortmund, D-44263, Germany
T. Kliem
Affiliation:
Raith GmbH, Dortmund, D-44263, Germany
R. Jede
Affiliation:
Raith GmbH, Dortmund, D-44263, Germany
X. Y. Sun
Affiliation:
GermanTech Co, Ltd, Beijing, 100190, Peoples Republic of China
X.F. Han
Affiliation:
Institute of Physics, Chinese Academy of Sciences, Beijing National Laboratory of Condensed Matter Physics, Beijing, 100190, Peoples Republic of China

Abstract

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Type
Abstract
Copyright
Copyright © Microscopy Society of America 2015 

References

[1] Baibich, M. N. et al., Physical Review Letters 61 (1988) 2472.Google Scholar
[2] Grunberg, P., et al., Physical Review Letters 57 (1986) 2442.Google Scholar
[3] Fert., A.. Reviews of Modern Physics 80 (2008) 1517.CrossRefGoogle Scholar
[4] Huai, Y., AAPPS Bulletin 18 (2008) 33.Google Scholar