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Nanofabrication Limits in Layered Ferroelectric Semiconductors via He-ion Beam

Published online by Cambridge University Press:  04 August 2017

Holland Hysmith ,
Alex Belianinov ,
Matthew J. Burch ,
Anton V. Ievlev ,
Vighter Iberi ,
Michael A. Susner ,
Michael A. McGuire ,
Peter Maksymovych ,
Marius Chyasnavichyus  and
Stephen Jesse
...Show all authors
Holland Hysmith
Affiliation:
Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831
Alex Belianinov
Affiliation:
Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831 The Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, TN 37831
Matthew J. Burch
Affiliation:
Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831 The Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, TN 37831
Anton V. Ievlev
Affiliation:
Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831 The Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, TN 37831
Vighter Iberi
Affiliation:
Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831 Department of Materials Science and Engineering, University of Tennessee, Knoxville, Knoxville TN 37996
Michael A. Susner
Affiliation:
Materials Sciences and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831
Michael A. McGuire
Affiliation:
Materials Sciences and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831
Peter Maksymovych
Affiliation:
Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831 The Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, TN 37831
Marius Chyasnavichyus
Affiliation:
Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831 The Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, TN 37831
Stephen Jesse
Affiliation:
Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831 The Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, TN 37831
Olga S. Ovchinnikova
Affiliation:
Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831 The Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, TN 37831

Abstract

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Abstract
Information
Microscopy and Microanalysis , Volume 23 , Supplement S1: Proceedings of Microscopy & Microanalysis 2017 , July 2017 , pp. 262 - 263
Copyright
© Microscopy Society of America 2017 

References

[1] Chhowalla, M., et al. The chemistry of two-dimensional layered transition metal dichalcogenide nanosheets. Nature chemistry 5, 263–275, 2013.Google Scholar
[2] David, C Joy , . Helium Ion Microscopy: Principles and Applications, First ed Springer New York USAHeidelberg Germany, Dordrecht Netherlands, London United Kingdom 2013.Google Scholar
[3] Belianinov, A., et al. Polarization control via He-ion beam induced nanofabrication in layered ferroelectric semiconductors. ACS applied materials & interfaces 8, 7349–7355, 2016.Google Scholar
[4] Research was supported (M.B., H.H., V. I., A.V.I., M.C., P.M.,O. S. O) and partially conducted (AFM, HIM, ToF-SIMS) at the Center for Nanophase Materials Sciences, which is sponsored at Oak Ridge National Laboratory by the Scientific User Facilities Division, Office of Basic Energy Sciences, US Department of Energy. Research was partially sponsored by the Laboratory Directed Research and Development Program of Oak Ridge National Laboratory, managed by UT-Battelle, LLC, for the U. S. Department of Energy (HIM, A. B., crystal growth, M.A.S. and M.A.M.)..Google Scholar
[5] F Author in “Introduction to abstract writing”, ed. D Writers, (Publisher, City) p.1..Google Scholar