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Secondary Electron Yield at High Voltages up to 300 keV

Published online by Cambridge University Press:  23 September 2015

Jane Howe ,
David Hoyle ,
Kota Ueda ,
Stas Dogel ,
Hooman Hosseinkhannazer ,
Matthew Reynolds ,
Rene Veillette ,
Michel L. Trudeau  and
David Joy
Jane Howe
Affiliation:
Hitachi High-Technologies Canada Inc, Toronto, Canada.
David Hoyle
Affiliation:
Hitachi High-Technologies Canada Inc, Toronto, Canada.
Kota Ueda
Affiliation:
Hitachi High-Technologies Canada Inc, Toronto, Canada.
Stas Dogel
Affiliation:
Hitachi High-Technologies Canada Inc, Toronto, Canada.
Hooman Hosseinkhannazer
Affiliation:
Norcada Inc, Edmonton, Canada.
Matthew Reynolds
Affiliation:
Norcada Inc, Edmonton, Canada.
Rene Veillette
Affiliation:
Institut de recherche d'Hydro-Quebec, Varennes, Canada
Michel L. Trudeau
Affiliation:
Institut de recherche d'Hydro-Quebec, Varennes, Canada
David Joy
Affiliation:
Department of Materials Science and Engineering, University of Tennessee, Knoxville, USA. Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, USA.

Abstract

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Abstract
Information
Microscopy and Microanalysis , Volume 21 , Supplement S3: Proceedings of Microscopy & Microanalysis 2015 , August 2015 , pp. 1705 - 1706
Copyright
Copyright © Microscopy Society of America 2015 

References

References:

[1] Zhu, Y et al Nature Materials 8 2009 808 CrossRefGoogle Scholar
[2] Howe, JY et al Journal of Power Source 221 2013 455 Google Scholar
[3] Howe, JY et al Nano Research Letters 9 2014 CrossRefGoogle Scholar
[4] Seiler, H J. Appl. Phys. 54 1983 R1 Google Scholar
[5] Lin, Y Joy, DC Surf. Inter. Analy 37 2005 895 Google Scholar
[7] Reimer, H Drescher, H J. Phys. D: Appl. Phys 10 1977 805 Google Scholar
[8] We thank the insightful discussions with Dr. Donovan Leonard and Dr. Martha McCartney Google Scholar