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Adhesion force and Nanotribological Characteristics of Chemical Vapor Deposited Fluorocarbon Films

Published online by Cambridge University Press:  01 February 2011

Nam-Kyun Kim ,
Tae-Gon Kim ,
Jin-Goo Park ,
Woon-Bae Kim  and
Hyung- Jae Shin
Nam-Kyun Kim
Affiliation:
Dept. of Metallurgy and Materials Eng., Hanyang University, Ansan, 425–791, Korea
Tae-Gon Kim
Affiliation:
Dept. of Metallurgy and Materials Eng., Hanyang University, Ansan, 425–791, Korea
Jin-Goo Park
Affiliation:
Dept. of Metallurgy and Materials Eng., Hanyang University, Ansan, 425–791, Korea
Woon-Bae Kim
Affiliation:
Samsung Advanced Institute of Technology, Suwon, 440–600, Korea
Hyung- Jae Shin
Affiliation:
Samsung Advanced Institute of Technology, Suwon, 440–600, Korea
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Abstract

In this study, Adhesion force and Nanotribological Characteristics of fluorocarbon (FC) films on Al deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) were evaluated. The contact angle of FC thin films on Al was measured to be around 110°. The surface energy was calculated to be 15 dynes/cm from the measurements of contact angles of polar and nonpolar solutions on surfaces. The contact angle hysteresis, which is an indicator for the surface heterogeneity, was lower than 30°. The friction force of FC films coated surfaces was three times lower than bare Al. The adhesion force of bare Al was measured to be around 9.6nN. The presence of FC films on Al reduced it to below 4nN. Fourier transform infra-red (FTIR) spectra showed the presence of fluorocarbon groups such as –CFn- and =CF=CF2.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 782: Symposium A – Micro- and Nanosystems , 2003 , A5.55
Copyright
Copyright © Materials Research Society 2004

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References

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