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Chemical Vapor Deposition of Epmtaxial BaTiO3 Films for Frequency Doubling Devices

Published online by Cambridge University Press:  21 February 2011

Peter C. Van Buskirk ,
Gregory T. Stauf ,
Robin Gardiner ,
Peter S. Kirlin ,
B. Bihari  and
J. Kumar
Peter C. Van Buskirk
Affiliation:
Advanced Technology Materials, Danbury, CT
Gregory T. Stauf
Affiliation:
Advanced Technology Materials, Danbury, CT
Robin Gardiner
Affiliation:
Advanced Technology Materials, Danbury, CT
Peter S. Kirlin
Affiliation:
Advanced Technology Materials, Danbury, CT
B. Bihari
Affiliation:
University of Massachusetts-Lowell, G. Gallatin
J. Kumar
Affiliation:
University of Massachusetts-Lowell, G. Gallatin
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Abstract

Ferroelectric materials such as BaTiO3 are notable for their nonlinear optical and electrical properties. Optical frequency doubling in thin films integrated with compact semiconductor laser pumped solid state lasers is an attractive candidate for high efficiency generation of blue light. Chemical vapor deposition (CVD) using a single liquid source has been used to grow BaTiO3 films on MgO. X-ray diffraction in the pole figure configuration indicates the films to be epitaxial, and rocking curves had FWHM ≈ 0.7°. An optical scatterometer (λ = 633 nm.) has been used to identify deposition conditions that result in the lowest scatter losses. This paper describes these results as well as waveguide designs to enhance the second harmonic generation efficiency in epitaxial BaTiO3 films on MgO.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 310: Symposium N – Ferroelectric Thin Films III , 1993 , 119
Copyright
Copyright © Materials Research Society 1993

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References

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