Hostname: page-component-848d4c4894-x24gv Total loading time: 0 Render date: 2024-06-03T13:49:20.994Z Has data issue: false hasContentIssue false
  • English
  • Français

Combinatorial Pulsed Laser Deposition of ITO-ZnO:Al Thin Films for Solar Cells Applications

Published online by Cambridge University Press:  01 February 2011

Doina Craciun ,
Gabriel Socol ,
Ion N. Mihailescu  and
Valentin Craciun
Doina Craciun
Affiliation:
doinacraciun03@hotmail.com, NILPRP, Lasers, STR. ATOMISTILOR NR. 409, C.P. MG 35, MAGURELE, Bucharest, 077125, Romania, +40214574491
Gabriel Socol
Affiliation:
gabriel.socol@inflpr.ro, National Institute for Laser, Plasma and Radiation Physics, Bucharest, 077125, Romania
Ion N. Mihailescu
Affiliation:
ion.mihailescu@inflpr.ro, National Institute for Laser, Plasma and Radiation Physics, Bucharest, 077125, Romania
Valentin Craciun
Affiliation:
valentin.craciun@inflpr.ro, National Institute for Laser, Plasma and Radiation Physics, Bucharest, 077125, Romania
Get access

Abstract

Transparent and conductive mixtures of ITO-ZnO and ITO-ZnO:Al have been deposited by a combinatorial pulsed laser deposition on Si and quartz substrates. Measurements of the In to Zn ratios along the transversal axis of the substrates were performed using energy dispersive x-ray spectroscopy. From simulations of the x-ray reflectivity spectra, collected with a 2 mm mask on different locations along the transversal axis of the samples, the density and thickness of the deposited films were calculated and then the In to Zn ratios. The crystalline structure and electrical properties of the deposited films were also investigated along the same axis. Changes in the ratio of In/Zn along this axis resulted in changes of the lattice constant, texture, optical and electrical properties of the films. By changing the In to Zn ration we could tailor the properties of the transparent electrode and found ways to partially replace the more expensive ITO material with ZnO.

Keywords

laser ablationtransparent conductorcombinatorial synthesis
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1074: Symposium I – Synthesis and Metrology of Nanoscale Oxides and Thin Films , 2008 , 1074-I05-05
Copyright
Copyright © Materials Research Society 2008

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Chebotareva, A. B. Untila, G. G. Kost, T. N. Jorgensen, S., Ulyashin, A. G. Thin Solid Films 515, 8505–8510, 2007.Google Scholar
2. CD, Gu, Li, J, JS, Lian, GQ, Zheng, Appl. Surf. Sci. 253, pp. 7011–7015 (2007).Google Scholar
3. Matsubara, K., Fons, P., Iwata, K., Yamada, A., Sakurai, K., Tampo, H. and Niki, S., Thin Solid Films Volumes 431-432, 369–372, 2003.Google Scholar
4. Minami, T, Thin Solid Films 516, 1314–1321, 2008 Google Scholar
5. Jeong, S. H. Lee, S. B. Boo, J. H. Current Applied Physics 4, 655–658, 2004 Google Scholar
6. Christen, M. H. Silliman, S. D. and Harshavardhan, K. S. Rev. Sci. Instrum. 72, 2673–2678, 2001.Google Scholar
7. Bassim, N. D. Schenck, P. K. Otani, M., and Oguchi, H., Rev. Sci. Instrum. 78, 072203 (1-7), 2007.Google Scholar
8. Chevrier, V., Dahn, J. R. Measurement Science & Technology 17, 1399–1404, 2006 Google Scholar
9.International Center for Diffraction Data, JCPDS # 44-1087 and # 36-1451Google Scholar
10. Craciun, V., Perriere, J., Bassim, N., Singh, R.K. Craciun, D., and Spear, J., Low temperature growth of epitaxial ZnO films on (001) sapphire by ultraviolet-assisted pulsed laser deposition, Appl. Phys. A-Mater 69, pp. S531–S533, 1999.Google Scholar
11. Amirhaghi, S, Craciun, V, Craciun, D, Elders, J, IW, Boyd, Low-temperature growth of highly transparent c-axis oriented ZnO thin-films by pulsed laser deposition, Microelectronic Engineering 25, pp.321–326, 1994.Google Scholar
12. Adurodija, F. O. Izumi, H., Ishihara, T., Yoshioka, H., and Motoyama, M., Journal of Materials Science: Materials in Electronics 12, 57–61, 2001.Google Scholar
13. Fuhs, W, Plasma Deposited Thin Films, eds Mort, J and Jansen, F (Florida CRC), p. 45, 1986 Google Scholar