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Deposition of Thick Silicon Layers on Glass Substrate for Photovoltaic Application

Published online by Cambridge University Press:  10 February 2011

M. Sarret ,
T. Mohammed-Brahim ,
G. Baudry ,
D. Briand  and
O. Bonnaud
M. Sarret
Affiliation:
GMV Université Rennes I, Campus de Beaulieu, 35042 Rennes Cedex, France
T. Mohammed-Brahim
Affiliation:
GMV Université Rennes I, Campus de Beaulieu, 35042 Rennes Cedex, France
G. Baudry
Affiliation:
GMV Université Rennes I, Campus de Beaulieu, 35042 Rennes Cedex, France
D. Briand
Affiliation:
GMV Université Rennes I, Campus de Beaulieu, 35042 Rennes Cedex, France
O. Bonnaud
Affiliation:
GMV Université Rennes I, Campus de Beaulieu, 35042 Rennes Cedex, France
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Abstract

A new silicon deposition reactor fabricated in our laboratory is presented in this paper. It works at Sub-Atmospherical total pressure, so it is a SAPCVD reactor. The deposition rates and electronic transport properties are compared with a conventional LPCVD reactor.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 485: Symposium G – Thin Film Structures for Photovoltaics , 1997 , 37
Copyright
Copyright © Materials Research Society 1998

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