Hostname: page-component-848d4c4894-ttngx Total loading time: 0 Render date: 2024-06-02T01:02:58.849Z Has data issue: false hasContentIssue false
  • English
  • Français

Effects of Ferromagnetic Capping Layers on the Perpendicular Anisotropy of Ni/Cu(001) Films.

Published online by Cambridge University Press:  15 February 2011

W. L. O'Brien  and
B. P. Tonner
W. L. O'Brien
Affiliation:
Synchrotron Radiation Center, University of Wisconsin-Madison, 3731 Schneider Drive, Stoughton, WI 53589
B. P. Tonner
Affiliation:
Synchrotron Radiation Center, University of Wisconsin-Madison, 3731 Schneider Drive, Stoughton, WI 53589 Department of Physics, University of Wisconsin- Milwaukee, 1900 East Kenwood Blvd., Milwaukee, WI 53211
Get access

Extract

The effects of ferromagnetic capping layers on the perpendicular magnetic anisotropy of Ni/Cu(001) have been studied. X-ray magnetic circular dichroism was used to obtain element specific magnetic information, including hysteresis loops for both in-plane and perpendicular magnetization. A 15 ML Ni/Cu(001) film maintains its perpendicular magnetic orientation after the addition of a 2.5 ML Fe capping layer. The Fe capping layer reduces the area of the Ni hysteresis loop by a factor of 2.0. A 2.0 ML capping layer of Co on 15 ML Ni/Cu(001) switches the easy axis of magnetization from perpendicular to in-plane.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 375: Symposia AA – Applications of Synchrotron Radiation Techniques to Materials Science , 1994 , 77
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Neel, L., J. Phys. Rad. 15, 376 (1954).Google Scholar
2 Gay, J. G. and Richter, R., Phys. Rev. Lett. 56, 2729 (1986).Google Scholar
3 Thomassen, J., May, F., Feldmann, B., Wuttig, M., and Ibach, H., Phys. Rev. Lett, 69, 3831 (1992).Google Scholar
4 Kief, M. T. and Egelhoff, W. F., J. Appl. Phys. 73, 6195 (1993).Google Scholar
5 O'Brien, W. L. and Tonner, B. P., Phys. Rev. B 49, 15370 (1994).Google Scholar
6 Hansen, R. W. C., O'Brien, W. L. and Tonner, B. P., Nucl. Instrum. Methods, Phys. Res. A 347, 148 (1994).Google Scholar
7 Li, H. and Tonner, B. P., Phys. Rev. B 40, 10241 (1989).Google Scholar
8 Johnson, K. E., Chambliss, D. D., Wilson, R. J. and Chiang, S., J. Vac. Sci. Technol. A 11, 1654 (1993).Google Scholar
9 O'Brien, W. L. and Tonner, B. P., Phys. Rev. B 50, 2963 (1994).Google Scholar