Hostname: page-component-848d4c4894-4hhp2 Total loading time: 0 Render date: 2024-06-02T03:00:20.691Z Has data issue: false hasContentIssue false

Electroabsorption Spectra of Hydrogenated Amorphous and Microcrystalline Silicon

Published online by Cambridge University Press:  15 February 2011

Lin Jiang
Affiliation:
Department of Physics, Syracuse University, Syracuse, NY 13244–1130
E. A. Schiff
Affiliation:
Department of Physics, Syracuse University, Syracuse, NY 13244–1130
F. Finger
Affiliation:
Forschungszentrum Juelich GmbH, ISI-PV, D-52425 Juelich, Germany
P. Hapke
Affiliation:
Forschungszentrum Juelich GmbH, ISI-PV, D-52425 Juelich, Germany
S. Koynov
Affiliation:
Physics Department, Technical University of Munich, D-85747 Garching, Germany
R. Schwarz
Affiliation:
Physics Department, Technical University of Munich, D-85747 Garching, Germany
N. Wyrsch
Affiliation:
Institut de Microtechnique, University de Neuchatel, CH-2000 Neuchatel, Switzerland
A. Shah
Affiliation:
Institut de Microtechnique, University de Neuchatel, CH-2000 Neuchatel, Switzerland
J. Yang
Affiliation:
United Solar Systems Corp., 1100 West Maple Road, Troy, Michigan 48084
S. Guha
Affiliation:
United Solar Systems Corp., 1100 West Maple Road, Troy, Michigan 48084
Get access

Abstract

We report on electroabsorption spectra for plasma deposited thin films of hydrogenated silicon ranging from amorphous (a-Si:H) to microcrystalline (μc-Si-H) structures. The EA spectrum of a-Si:H deposited from silane with low hydrogen dilution were consistent with previous works; material prepared with high hydrogen dilution showed a 0.07 eV blue shift of the spectrum and somewhat stronger electroabsorption. μc-Si-H specimens have a sharp peak at 1.19eV; the spectrum is blue shifted by 0.03 eV and is significantly stronger than electroabsorption reported in single crystal silicon. Spectral features which have no correspondence to single crystal silicon were also observed in μc-Si-H. Specimens deposited using “cyclic” deposition and chemical annealing had electroabsorption spectra with both the 1.19 eV, crystalline feature and a band peaking at 2.02 eV which we attribute to strongly hydrogenated a-Si:H. We discuss applications of electroabsorption to determining the crystal fraction of microcrystalline material and to determining grain size distributions.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Frova, A., Handler, P., Germano, F. A., and Aspnes, D. E., Phys. Rev. 145, 575(1966).Google Scholar
2. Penchina, C. M., Phys. Rev. 138, A924(1965).Google Scholar
3. Hamakawa, Y., in Semiconductors and Semimetals, Vol. 21B, edited by Willardson, R. K. and Beer, (Wiley, New York, 1984), pp. 141158.Google Scholar
4. Al Jalali, S. and Weiser, G., J. Non-Crystalline Solids 41, 1(1980).Google Scholar
5. Dersch, U., Gruenewald, M., Overhof, H., and Thomas, P., J. Phys. C 20, 121(1987).Google Scholar
6. Koynov, S., Schwarz, R., Fischer, T., Grebner, S., and Münder, H., Jpn. J. Appl. Phys. 33, 4534(1994).Google Scholar
7. Luysberg, M., Hapke, P., Carius, R., and Finger, F., Phil. Mag. A, 75, 31 (1997).Google Scholar
8. Torres, P., Meier, J., Platz, R., Dubail, S., Kroll, U., Anna Selvan, J. A., Pellaton Vaucher, N., Hof, Ch., Fischer, D., Keppner, H., Shah, A., Ufert, K.-D., Gainnoules, P., and Koehler, J., in Amorphous Silicon Technology - 1996, edited by Hack, M., et al (Materials Research Society, Symposium Proceedings Vol. 420, Pittsburgh, 1996), 3.Google Scholar
9. Takagahara, T. and Takeda, K., Phys. Rev. B 46, 15578 (1992).Google Scholar