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Electron Time-of-Flight Measurements in Porous Silicon

Published online by Cambridge University Press:  15 February 2011

Prasanna Rao
Affiliation:
Dept. of Physics, Syracuse University, Syracuse, NY 13244–1130
E. A. Schiff
Affiliation:
Dept. of Physics, Syracuse University, Syracuse, NY 13244–1130
L. Tsybeskov
Affiliation:
Department of Electrical Engineering, University of Rochester, Rochester NY 14627
P. M. Fauchet
Affiliation:
Department of Electrical Engineering, University of Rochester, Rochester NY 14627
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Abstract

Transient photocurrent measurements are reported in an electroluminescent porous silicon diode. Electron drift mobilities are obtained from the data as a function of temperature. Electron transport is dispersive, with a typical dispersion parameter α≈ 0.5. The range of mobilities is 10−5 − 10−4 cm2Vs between 225 K amd 400 K. This temperature-dependence is much less than expected for multiple-trapping models for dispersion, and suggests that a fractal structure causes the dispersion and the small mobilities.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

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References

REFERENCES

[1]Canham, L.T., Appl Phys. Lett. 57, 1046 (1990).Google Scholar
[2]Koshida, N. and Koyama, H., Nanotechnology 3, 192 (1992).Google Scholar
[3]Steiner, P., Kozlowski, F., and Lang, W., Appl. Phys. Lett. 62, 2700 (1993).Google Scholar
[4]Namavar, F., Maruska, H.P., and Kalkhoran, N.M., Appl. Phys. Lett. 60, 2514 (1992).Google Scholar
[5]Fejfar, A., Pelant, I., Sipek, E., Kocka, J., Juska, G., Matsumoto, T., and Kanemitsu, Y., Appl. Phys. Lett. 66, 1098 (1995).Google Scholar
[6]Ben-Chorin, M., Moller, F., Koch, F., Schirmahcer, W., and Eberhard, M., Phys. Rev. B5, 2199(1995).Google Scholar
[7]Peng, C. and Fauchet, P.M., Appl. Phys. Lett. 67, 2515 (1995).Google Scholar
[8]Wang, Q., Antoniadis, H., Schiff, E.A., and Guha, S., Phys. Rev. B 47, 9435 (1993).Google Scholar
[9]Tsybeskov, L., Duttagupta, S.P., Hirschman, K.D., and Fauchet, P.M., Appl. Phys. Lett. 68, 2058 (1996).Google Scholar
[10]Gu, Q., Wang, Q., Schiff, E.A., Li, Y.-M., and Malone, C.T., J. Appl. Phys. 76, 2310 (1994).Google Scholar
[11]Monroe, D., Phys. Rev. Lett. 54, 146 (1985);Google Scholar
Grünewald, M. and Thomas, P., Phys. Status Solidi B 94, 125 (1979).Google Scholar
[12]Overhof, H., in Amorphous Silicon Technology—1992, edited by Thompson, M.J., et al. (Materials Research Society, Symposia Proceedings Vol. 258, Pittsburgh, 1992), pp. 681692.Google Scholar
[13]Gefen, Y., Aharony, A., and Alexander, S., Phys. Rev. Lett. 50, 77 (1983); see alsoGoogle Scholar
Nakayama, T., Yakubo, K., and Orbach, R., Rev. Mod. Phys. 66, 381 (1994).Google Scholar