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A Field Emission Study of the Critical Parameters of Amorphous Carbon Films Deposited on a Variety of Carbonaceous Substrates

Published online by Cambridge University Press:  10 February 2011

A. P. Burden
Affiliation:
School of Electronic Engineering, Information Technology & Mathematics, University of Surrey, Guildford, GU2 5XH, U.K.
R. Forrest
Affiliation:
School of Electronic Engineering, Information Technology & Mathematics, University of Surrey, Guildford, GU2 5XH, U.K.
S.R.P. Silva
Affiliation:
School of Electronic Engineering, Information Technology & Mathematics, University of Surrey, Guildford, GU2 5XH, U.K.
B. J. Sealy
Affiliation:
School of Electronic Engineering, Information Technology & Mathematics, University of Surrey, Guildford, GU2 5XH, U.K.
G.A.J. Amaratunga
Affiliation:
Department of Electronic and Electrical Engineering, University of Liverpool, P.O. Box 147, Liverpool, L69 3BX, U.K.
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Abstract

The field emission properties of a variety of nitrogen-containing hydrogenated amorphous carbon films have been characterised as a function of film thickness and substrate type. Identified trends have been discussed in terms of the optical band-gap and refractive index of the films, and the surface roughness of the substrates. In addition, carbon-based materials have been considered as inexpensive film-compatible substrates, and an in-situ oxygen plasma pre-treatment has been investigated as a means of changing the field enhancement factor of the system. We have achieved field emission with threshold voltages as low as 8 V μm−1, and we present data that supports the view that the electron emission from amorphous carbon is dependent on the nature of the back contact, and possibly the ease at which the film can be fully depleted, i.e. film thickness.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

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References

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