Hostname: page-component-848d4c4894-75dct Total loading time: 0 Render date: 2024-06-01T22:25:45.430Z Has data issue: false hasContentIssue false
  • English
  • Français

Hard Amorphous Hydrogenated Carbon Films Deposited from an Expanding Thermal Plasma

Published online by Cambridge University Press:  15 February 2011

J. W. A. M. Gielen ,
M. C. M. Van De Sanden ,
W. M. M. Kessels  and
D. C. Schram
J. W. A. M. Gielen
Affiliation:
Eindhoven University of Technology, Department of Physics, PO Box 513, 5600 MB Eindhoven, The Netherlands - m.c.m.v.d.sanden @phys.tue.nl
M. C. M. Van De Sanden
Affiliation:
Eindhoven University of Technology, Department of Physics, PO Box 513, 5600 MB Eindhoven, The Netherlands - m.c.m.v.d.sanden @phys.tue.nl
W. M. M. Kessels
Affiliation:
Eindhoven University of Technology, Department of Physics, PO Box 513, 5600 MB Eindhoven, The Netherlands - m.c.m.v.d.sanden @phys.tue.nl
D. C. Schram
Affiliation:
Eindhoven University of Technology, Department of Physics, PO Box 513, 5600 MB Eindhoven, The Netherlands - m.c.m.v.d.sanden @phys.tue.nl
Get access

Abstract

Diamondlike amorphous hydrogenated carbon is deposited from an expanding thermal argon/acetylene plasma. It is observed that the film quality improves with increasing deposition rate. To obtain the best material quality the admixed acetylene flow has to be of comparable magnitude as the argon ion flow from the plasma source (critical loading). A new method to determine the ion density in an argon/acetylene plasma, by probe measurements, is presented. They reveal that the deposition during critical loading is governed by radicals. It is suggested that acetylene is dissociated once and that the C2H radical is formed dominantly.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 436: Symposium CC – Thin Films Stresses and Mechanical Properties VI , 1996 , 287
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Robertson, J., Surf. Coat. Technol. 50, p. 185 (1992).Google Scholar
[2] Catherine, Y. in Diamond and Diamondlike Films and Coatings, edited by Clausing, R.E. et al. (NATO ASI Series B 266, Plenum Press, New York, 1991), p. 173.Google Scholar
[3] von Keudell, A. in Film Synthesis and Growth Using Energetic Beams, edited by Atwater, H.A. et al. (Mat. Res. Soc. Proc. 388,Pittsburgh, PA, 1995), p. 355.Google Scholar
[4] Gielen, J.W.A.M., M van de Sanden, M.C., Kleuskens, P.R.M. and Schram, D.C., Plasma Sources Sci. Technol., accepted for publication.Google Scholar
[5] Gielen, J.W.A.M., Kleuskens, P.R.M., van de Sanden, M.C.M., van IJzendoorn, L.J., Schram, D.C., Dekempeneer, E.H.A. and Meneve, J., submitted for publication.Google Scholar
[6] Sanden, M.C.M. van de, Severens, R.J., Gielen, J.W.A.M., Paffen, R.M.J. and Schram, D.C., Plasma Sources Sci. Technol., accepted for publication.Google Scholar
[7] Maier, W.B., J. Chem. Phys. 42, p. 1790 (1965).Google Scholar
[8] Mul, P.M. and McGowan, J.W., Astrophys. J. 237, p. 749 (1980).Google Scholar
[9] von Keudell, A., Growth mechanisms during the plasma enhanced chemical vapour deposition of hydrocarbon films. investigated by in situ ellipsometry, Thesis, Max - Planck Institut für Plasmaphyisk, Garching bei München, 1996.Google Scholar
[10] Hershkowitz, N. in Plasma Diagnostics 1, edited by Auciello, O. and Flamm, D.L. (Academic Press Inc., Boston, 1989)Google Scholar
[11] Flender, U. and Wiesemann, K., Plasma. Chem. Plasma. Proces. 15, p. 123, (1995).Google Scholar