Hostname: page-component-848d4c4894-5nwft Total loading time: 0 Render date: 2024-05-18T08:58:10.731Z Has data issue: false hasContentIssue false

Light Induced ESR Measurements on Microcrystalline Silicon with Different Crystalline Volume Fractions

Published online by Cambridge University Press:  09 August 2011

J. Müller
Affiliation:
Forschungszentrum Jülich, ISI-PV, D-52425 Jiilich
F. Finger
Affiliation:
Forschungszentrum Jülich, ISI-PV, D-52425 Jiilich
P. Hapke
Affiliation:
Forschungszentrum Jülich, ISI-PV, D-52425 Jiilich
H. Wagner
Affiliation:
Forschungszentrum Jülich, ISI-PV, D-52425 Jiilich
Get access

Abstract

Microcrystalline silicon with various crystalline volume fractions was prepared by plasma enhanced chemical vapour deposition. The material was studied by steady state and transient electron spin resonance in the dark and under light illumination. The observed resonances at g-values of 2.01, 2.0052, 2.0043, 1.998 can be attributed to the amorphous and microcrystalline constituents, and their respective intensities change as the ratio of amorphous to crystalline volume is varied. The origin of a fifth resonance at g = 1.995 remains unclear. Smaller crystalline volume fractions lead to lower spin densities and affect the recombination behaviour of photogenerated charge carriers. The recombination behaviour in highly crystalline material is also influenced by moderate Fermi level shifts, where differences show up between n-type (or undoped) and p-type samples. The differences are attributed to trapping of photo-generated holes in deep states within the disordered regions.

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Meier, J., Fltickiger, R., Keppner, H., and Shah, A., Appl. Phys. Lett. 65, 860 (1994)Google Scholar
2. Vetterl, O., Hapke, P., Kluth, O., Lambertz, A., Wieder, S., Rech, B., Finger, F., and Wagner, H., to be published in: Solid State Phenomena, Polycrystalline Semiconductors V - Bulk Materials, Thin Films and Devices, edited by Werner, J. H., Strunk, H. P., and Schock, H. W. (Scitech Publ., Uettikon am See, 1999)Google Scholar
3. Finger, F., Müller, J., Malten, C., and Wagner, H., Phil. Mag. B 77, 805 (1998)Google Scholar
4. Hasegawa, S., Narikawa, S., and Kurata, Y., Phil. Mag. B 48, 431 (1983)Google Scholar
5. Müller, J., Finger, F., Carius, R., and Wagner, H., Mat. Res. Soc. Symp. Proc. 507, 1998 Google Scholar
6. Hapke, P. and Finger, F., J. Non-Cryst. Solids 227–230, 861 (1998)Google Scholar
7. Houben, L., Luysberg, M., Hapke, P., Carius, R., Finger, F., and Wagner, H., Phil. Mag. A 77, 1447 (1998)Google Scholar
8. Müiller, J., Malten, C., Finger, F., and Wagner, H. in The Physics of Semiconductors edited by Scheffler, M. and Zimmermann, R. (World Scientific, Singapore, 1997), pp. 26972700 Google Scholar
9. Müller, J., Finger, F., Malten, C., and Wagner, H., J. Non-Cryst. Solids 227–230, 1026 (1998)Google Scholar
10. Müller, J., PhD thesis, Rheinisch-Westfälische Technische Hochschule Aachen, 1998 Google Scholar