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Low Temperature Preparation of Y‐Ba‐Cu‐0 High Tc Superconducting Thin Films by Plasma‐Enhanced Organometallic Chemical Vapor Deposition

Published online by Cambridge University Press:  28 February 2011

Jing Zhao ,
Henry O. Marcy ,
Lauren M. Tonge ,
Bruce W. Wessels ,
Tobin J. Marks  and
Carl R. Kannewurf
Jing Zhao
Affiliation:
Department of Materials Science and Engineering Current address: EMCORE Co., 35 Elizabeth Ave., Somerset, NJ 08873
Henry O. Marcy
Affiliation:
Department of Electrical Engineering and Computer Science
Lauren M. Tonge
Affiliation:
Department of Chemistry
Bruce W. Wessels
Affiliation:
Department of Materials Science and Engineering Authors to whom correspondence should be addressed.Materials Research Center, Northwestern University, Evanston, IL 60208
Tobin J. Marks
Affiliation:
Department of Chemistry Authors to whom correspondence should be addressed.Materials Research Center, Northwestern University, Evanston, IL 60208
Carl R. Kannewurf
Affiliation:
Department of Electrical Engineering and Computer Science Authors to whom correspondence should be addressed.Materials Research Center, Northwestern University, Evanston, IL 60208
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Abstract

We report here a plasma‐enhanced organometallic chemical vapor deposition process for the preparation of YBa2Cu3O7‐x thin films using two rf plasma coupling configurations. For the films grown under a direct plasma glow, the YBa2Cu3O7‐x phase is not found in the as‐deposited state. However, by employing plasma‐activated nitrous oxide as the reactant gas, superconducting YBa2Cu3O7‐x films having a low carbon content and a mirror‐like surface have been prepared in‐situ at a substrate temperature of 610°C using an organometallic chemical vapor deposition process.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 169: Symposium M – High Temperature Superconductors: Fundamental Properties and Novel Materials Processing , 1989 , 593
Copyright
Copyright © Materials Research Society 1990

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References

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