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Modeling the GAS-Phase Chemistry of Silicon Carbide Formation

Published online by Cambridge University Press:  15 February 2011

Mark D. Allendorf  and
Thomas H. Osterheld
Mark D. Allendorf
Affiliation:
Sandia National Laboratories, Mail Stop 9052 Livermore, CA 94551–0969
Thomas H. Osterheld
Affiliation:
Sandia National Laboratories, Mail Stop 9052 Livermore, CA 94551–0969
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Abstract

Methyltrichlorosilane (MTS) is a precursor commonly used in the production of silicon carbide for composites, protective coatings, and structural ceramics. Experiments suggest that MTS decomposes in the gas phase to produce a large number of species whose surface reactivity is expected to vary widely. In this work, we discuss the development of a gas-phase mechanism that describes the decomposition of MTS. Rate coefficients for the reactions were obtained from literature sources, theoretical methods, and comparisons with analogous reaction chemistry. Several unknown reaction rates were fit to experimental measurements of MTS decomposition. The results are used to predict the major reaction paths, identify reactions to which product concentrations are sensitive, and determine the rate-limiting step for MTS decomposition.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 363 , 1994 , 39
Copyright
Copyright © Materials Research Society 1995

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Footnotes

*

Work supported by the Advanced Industrial Materials Program of the U.S. Dept. of Energy Office of Industrial Technologies.

References

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