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Nanofabrication with the Helium Ion Microscope
Published online by Cambridge University Press: 22 May 2012
Abstract
Although initially developed as an imaging tool, the helium ion microscope (HIM) is finding applications in nanofabrication as its focused ion beam is capable of highly-localized material modification. In this study, an external pattern generator is used to explore the capabilities of the HIM for localized milling of a ∼7 nm thick layer of silicon-on-insulator, with atomic force microscopy (AFM) used to characterize the resulting patterns. The dose and patterned area size are varied and milling to depths >7 nm is demonstrated. At high doses and large areas, protuberances form, primarily due to sub-surface swelling caused by the implanted helium. The results suggest this technique could enable the rapid prototyping of next-generation nanoelectronic devices in thin silicon.
- Type
- Research Article
- Information
- MRS Online Proceedings Library (OPL) , Volume 1412: Symposium FF – Mechanical Nanofabrication, Nanopatterning and Nanoassembly , 2012 , mrsf11-1412-ff08-08
- Copyright
- Copyright © Materials Research Society 2012
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