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Synchrotron X-ray Microdiffraction Images of Polarization Switching in Epitaxial PZT Capacitors with Pt and SrRuO3 Top Electrodes

Published online by Cambridge University Press:  01 February 2011

Dal-Hyun Do ,
Dong Min Kim ,
Chang-Beom Eom ,
Eric M. Dufresne ,
Eric D. Isaacs  and
Paul G. Evans
Dal-Hyun Do
Affiliation:
Department of Materials Science and Engineering, University of Wisconsin, Madison, WI 53706
Dong Min Kim
Affiliation:
Department of Materials Science and Engineering, University of Wisconsin, Madison, WI 53706
Chang-Beom Eom
Affiliation:
Department of Materials Science and Engineering, University of Wisconsin, Madison, WI 53706
Eric M. Dufresne
Affiliation:
Department of Physics, University of Michigan, Ann Arbor, MI 48109
Eric D. Isaacs
Affiliation:
Center for Nanoscale Materials, Argonne National Laboratory, Argonne, IL 60439
Paul G. Evans
Affiliation:
Department of Materials Science and Engineering, University of Wisconsin, Madison, WI 53706
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Abstract

The evolution of stored ferroelectric polarization in PZT thin film capacitors was imaged using synchrotron x-ray microdiffraction with a submicron-diameter focused incident x-ray beam. To form the capacitors, an epitaxial Pb(Zr,Ti)O3 (PZT) thin film was deposited on an epitaxially-grown conductive SrRuO3 (SRO) bottom electrode on a SrTiO3 (STO) (001) substrate. Polycrystalline SRO or Pt top electrodes were prepared by sputter deposition through a shadow mask and subsequent annealing. The intensity of x-ray reflections from the PZT film depended on the local ferroelectric polarization. With 10 keV x-rays, regions of opposite polarization differed in intensity by 26% in our PZT capacitor with an SRO top electrode. Devices with SRO electrodes showed just a 25% decrease in the remnant polarization after 107 switching cycles. In devices with Pt top electrodes, however, the switchable polarization decreased a by 70% after only 5×104 cycles.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 784: Symposium C – Ferroelectric Thin Films XII , 2003 , C6.4
Copyright
Copyright © Materials Research Society 2004

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