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UHV Preparation and In-Situ Surface Analysis of MNFE/Nife Exchange Structures: Interfacial Impurity Incorporation

Published online by Cambridge University Press:  03 September 2012

Susan L. Cohen ,
John M. Baker ,
Michael A. Russak ,
Gerald J. Scilla ,
Cherngye Hwang  and
Stephen M. Rossnagel
Susan L. Cohen
Affiliation:
IBM T.J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY 10598
John M. Baker
Affiliation:
IBM T.J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY 10598
Michael A. Russak
Affiliation:
IBM-ADSTAR, 5600 Cottle Road, San Jose, CA 95193
Gerald J. Scilla
Affiliation:
IBM Technology Products, 1000 River Road, Essex Junction, VT 05452
Cherngye Hwang
Affiliation:
IBM-ADSTAR, 5600 Cottle Road, San Jose, CA 95193
Stephen M. Rossnagel
Affiliation:
IBM T.J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY 10598
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Abstract

MnFe/NiFe exchange structures have been prepared in an ultra-high vacuum sputtering/surface analysis system. Controlled introduction of residual gas impurities such as O2 and H2O at the MnFe/NiFe interface is studied by in-situ x-ray photoelectron spectroscopy (XPS) and the exchange structures are magnetically characterized. Due to the extreme reactivity of the NiFe surface towards O2, the exchange coupling is severely degraded by only small exposures of this molecule to the NiFe surface. In contrast, H2O does not oxidize the NiFe surface and therefore can be tolerated in greater quantities in the sputtering chamber without detrimental loss of exchange. This understanding of the basic surface chemistry of the MnFe and NiFe surfaces can lead to improved sputtering practices in actual manufacturing applications.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 313: Symposium Q1 – Magnetic Ultrathin Films, Multilayers and Surfaces/Magnetic Interfaces-Physics and Characterizations , 1993 , 697
Copyright
Copyright © Materials Research Society 1993

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References

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