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The use of Rheed Intensities for the Quantitative Characterization of Surfaces

Published online by Cambridge University Press:  21 February 2011

Y. Ma ,
S. Lordi  and
J. A. Eades
Y. Ma
Affiliation:
Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL 61801-2985.
S. Lordi
Affiliation:
Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL 61801-2985.
J. A. Eades
Affiliation:
Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL 61801-2985.
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Abstract

RHEED is an important method for the in situ characterization of surfaces. Until recently, this characterization has not used the intensities of RHEED reflections. Improved methods of calculation have made it possible to simulate RHEED patterns from bulk-terminated, reconstructed and stepped surfaces. From the comparison between simulated and experimental patterns, it is now possible to refine the positions of atoms in surfaces and to determine the density of steps on surfaces (well almost).

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 399: Symposium D – Evolution of Epitaxial Structure and Morphology , 1995 , 3
Copyright
Copyright © Materials Research Society 1996

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References

REFERENCES

1 Ma, Y., Lordi, S. Eades, J. A., and Ino, S., Phys. Rev. B 49, 17488–17451 (1994).Google Scholar
2 Ma, Y., Lordi, S., Eades, J. A., Surf. Sci. 313, 317–334 (1994).Google Scholar
3 Lordi, S., Ma, Y., Eades, J. A., Ultramicroscopy 55, 284–292 (1994).Google Scholar
4 Ma, Y., Lordi, S., Flynn, C.P., and Eades, J. A., Surf. Sci. 302, 241–257 (1994).Google Scholar
5 Ma, Y., Lordi, S., and Eades, J. A., in Electron Microscopy 1994 : Proceedings of ICEM 13, edited by Jouffrey, B., and Collieux, C. (Les Editions de Physique, Les Ulis, France, 1994) 953.Google Scholar
6 Ma, Y., Lordi, S., Larsen, P.K., Eades, J. A., Surf. Sci. 289, 47–67 (1993).Google Scholar
7 Ma, Y., Acta Cryst. A 47, 37 (1991).Google Scholar
8 Ma, Y. Marks, L.D., Acta Cryst. A47, 707 (1991).Google Scholar
9 Zhao, T.C. Tong, S.Y., Phys. Rev. B 47, 3923–3928 (1995).Google Scholar
10 Smith, A.E. Josefsson, T.W., Ultramicroscopy 55, 247–252 (1994).Google Scholar
11 Ichimiya, A., Xue, Q.K., Sakurai, T., J. Crystal Growth 150, 136 (1995); Phys. Rev. B 51, 4200–4212 (1995).Google Scholar
12 Witte, M. and Meyer-Ehmsen, G., Surf. Sci. 328, L449–454 (1994).Google Scholar
13 McCoy, J.M. and Maksym, P.A., Surf. Sci. 310, 217–225 (1994).Google Scholar
14 Wang, Z.L., Rep. Prog. Phys. 56, 997–1065 (1993).Google Scholar
15 Peng, L.M. and Cowley, J.M., Surf. Sci. 199, 609 (1988).Google Scholar
16 Deininger, C., Mayer, J and Ruhle, M., Optik 99, 135–140 (1995).Google Scholar
17 Saunders, M., Bird, D.M., Midgley, P.A., and Vincent, R., in Electron Microscopy 1994 : Proceedings of ICEM 13. edited by Jouffrey, B., and Collieux, C. (Les Editions de Physique, Les Ulis, France, 1994) 847–848.Google Scholar
18 Spence, J.C.H., Acta Cryst. A49, 231–260 (1993).Google Scholar
19 Maksym, P.A. and Beeby, J.L., Surf. Sci. 110, 423–438 (1981).Google Scholar
20 Takayanagi, M., Tanishiro, Y., Takahashi, S. and Takahashi, M., Surf. Sci. 164, 367 (1985).Google Scholar
21 Tong, S.Y., Huang, H., Wei, CM., Packard, W.E., Men, F.K., Glander, G., and Webb, M.B., J. Vac. Sci. Tech. A 6, 615 (1988).Google Scholar
22 Robinson, I.K., Surf. Sci. 261, 123 (1992).Google Scholar
23 Ichimiya, A., Surf. Sci. 192, L893 (1987).Google Scholar
24 Qian, G.X., Chadi, D.J., Phys. Rev. B 35, 1288 (1987).Google Scholar
25 Brommer, K.D., Needels, M., Larson, B.E., and Joannopouls, J.D., Phys. Rev. Lett. 68, 1355 (1992).Google Scholar
26 Ino, S., Jpn. J. Appl. Phys. 19, 1277 (1980).Google Scholar
27 Ahn, C.C., Nikzad, S., and Atwater, H., in Advances in Suface and Thin Film Diffraction, edited by Huang, T.C., Cohen, P.J., and Eaglesham, D.J. (Mater. Res. Soc. Proc. 208, Pittsburgh, PA, 1991) pp. 251–260.Google Scholar
28 Aarts, J. Larsen, P.K., in Reflection High Energy Electron Diffraction and Reflection Electron Microscopy of Surface, edited by Larsen, P.K. and Dobson, P.J. (Nato ASI Series B 188, Plenum Press, New York, 1991) pp. 449–461.Google Scholar