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Capacitance Measurement Technique for Determining the Out-of-Plane Coefficient of Thermal Expansion for Low-k Dielectrics
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- Journal:
- MRS Online Proceedings Library Archive / Volume 863 / 2005
- Published online by Cambridge University Press:
- 01 February 2011, B8.14
- Print publication:
- 2005
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The Effect of Methylating Treatments on the Dielectric Reliability of Low-k/Cu Structures
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- Journal:
- MRS Online Proceedings Library Archive / Volume 863 / 2005
- Published online by Cambridge University Press:
- 01 February 2011, B8.12
- Print publication:
- 2005
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Pore Structure and Integration Performance of a Porous CVD Ultra Low k Dielectric
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- Journal:
- MRS Online Proceedings Library Archive / Volume 863 / 2005
- Published online by Cambridge University Press:
- 01 February 2011, B3.1
- Print publication:
- 2005
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