Hostname: page-component-848d4c4894-pftt2 Total loading time: 0 Render date: 2024-05-01T07:14:11.965Z Has data issue: false hasContentIssue false
  • English
  • Français

X-Ray Diffraction Investigation of Vacuum-Deposited Metallic Films

Published online by Cambridge University Press:  06 March 2019

Otto Renius
Otto Renius*
Affiliation:
Detroit Arsenal, Center Line, Michigan
Get access

Abstract

In the course of work on the vacuum deposition of metallic films, a series of X-ray diffraction investigations was run on the effects of base material orientation, heat treatment, and angle of deposition, on the structure of the deposed films. Results show that the film structure can be altered by changing several parameters during and after the deposition process. An attempt is made to correlate this structure with film adhesion and protective characteristics.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 4: Ninth Annual Conference on Applications of X-ray Analysis, August 10-12, 1960 , 1960 , pp. 63 - 73
Copyright
Copyright © International Centre for Diffraction Data 1960

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Wilburn, D. and Horn, C., “Vacuum Deposition of Corrosion Resistant Titanium Coatings,” OTAC Report RR-12, February, 1960.Google Scholar
2. Thun, R. and Hass, G., “Electron Diffraction Studies of Structure Changes in Vacuum-Deposited Films,’ Vacuum Symposium Transactions, 1958.Google Scholar
3. Rhodin, T. N., “Oriented Arrangements of Thin Aluminum Films Formed on Ionic Substrates,” Discussions Faraday Soc. (London), Vol. 5, 1949, p. 215.Google Scholar