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AFM Studies of Ni Electrodeposits on GaAs

Published online by Cambridge University Press:  30 December 2005

V. C. Zoldan ,
D. M. Kirkwood ,
G. Zangari ,
M. L. Munford ,
W. Figueiredo  and
A. A. Pasa
V. C. Zoldan
Affiliation:
Departamento de Física, UFSC, Brazil
D. M. Kirkwood
Affiliation:
University of Virginia
G. Zangari
Affiliation:
University of Virginia
M. L. Munford
Affiliation:
Departamento de Física — UFPR, Brazil
W. Figueiredo
Affiliation:
Departamento de Física, UFSC, Brazil
A. A. Pasa
Affiliation:
Departamento de Física, UFSC, Brazil
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Extract

In this study, the surface morphology of electrodeposited Ni on single crystal GaAs (001) was investigated by atomic force microscopy (AFM). The images show granular deposits with stepped contours typical of single-crystalline grains. The correlation length correlates very well with the size of the grains, indicating that the layers grow as columns with diameter increasing with thickness. This growth mechanism is observed for layers with thicknesses in the range of 10 to 500 nm at a deposition rate of ~0.5 nm/s.

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Microscopy and Microanalysis , Volume 11 , Issue S03 , December 2005 , pp. 154 - 157
Copyright
© 2005 Microscopy Society of America

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