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An Approach to Extend Electron Holography into Characterization on Dopant Profiles for FinFET of Nanometer Semiconductor Device in Wafer-foundries

Published online by Cambridge University Press:  30 July 2020

Wayne Zhao  and
Travis Mitchell
Wayne Zhao
Affiliation:
GLOBALFOUNDRIES US Inc., Malta, New York, United States
Travis Mitchell
Affiliation:
GLOBALFOUNDRIES US Inc., Malta, New York, United States

Abstract

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Type
Advances in Electron Microscopy to Characterize Materials Embedded in Devices
Information
Microscopy and Microanalysis , Volume 26 , Supplement S2 , August 2020 , pp. 1412 - 1413
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Copyright
Copyright © Microscopy Society of America 2020

References

Zhao, W. and Wang, Y., Microscopy & Microanalysis, Vol. 21 (Supplement 1), (201), pp.1490–1491.Google Scholar
Wang, Y., et al. , Ultramicroscopy, 124, (2013), pp. 117–129.10.1016/j.ultramic.2012.08.008CrossRefGoogle Scholar
Thanks to John Lemon and Frieder Baumann at Fab8 for inspiring discussions, and Management and Legal teams for supporting the publication clearance.Google Scholar