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Co-Deposition, Dissolution and Replacement Process during Electrochemical Deposition of Co/Cu Multilayers

Published online by Cambridge University Press:  05 September 2003

Á. Cziráki ,
T. Gemming ,
V. Weihnacht ,
K. Wetzig ,
L. Péter ,
J. Pádár ,
I. Bakonyi  and
G. Tichy
Á. Cziráki
Affiliation:
Department of Solid State Physics, Eötvös University. H-1518 Budapest, P.O.B. 32, Hungary
T. Gemming
Affiliation:
Leibniz-Institut für Festkörper- und Werkstoffforschung Dresden, PF 270116, D-01171 Dresden, Germany
V. Weihnacht
Affiliation:
Leibniz-Institut für Festkörper- und Werkstoffforschung Dresden, PF 270116, D-01171 Dresden, Germany
K. Wetzig
Affiliation:
Leibniz-Institut für Festkörper- und Werkstoffforschung Dresden, PF 270116, D-01171 Dresden, Germany
L. Péter
Affiliation:
Research Institute for Solid State Physics and Optics, HAS. H-1525 Budapest, POB 49, Hungary
J. Pádár
Affiliation:
Research Institute for Solid State Physics and Optics, HAS. H-1525 Budapest, POB 49, Hungary
I. Bakonyi
Affiliation:
Research Institute for Solid State Physics and Optics, HAS. H-1525 Budapest, POB 49, Hungary
G. Tichy
Affiliation:
Department of Solid State Physics, Eötvös University. H-1518 Budapest, P.O.B. 32, Hungary
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Abstract

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Type
Invited Papers
Information
Microscopy and Microanalysis , Volume 9 , Issue S03 , September 2003 , pp. 244 - 245
Copyright
Copyright © Microscopy Society of America 2003

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