A Comparison of Xenon Plasma FIB Technology with Conventional Gallium LMIS FIB: Imaging, Milling, and Gas-Assisted Applications

R Young; C Rue; S Randolph; C Chandler; G Franz; R Schampers; A Klumpp; L Kwakman

doi:10.1017/S1431927611004132

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Extended abstract of a paper presented at Microscopy and Microanalysis 2011 in Nashville, Tennessee, USA, August 7–August 11, 2011.

Crossref Citations

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Moreau, S. Bouchu, D. and Audoit, G. 2014. Fast and easy sample preparation with reduced curtaining artifacts using a P-FIB. p. 231.

Altmann, Frank and Young, Richard J. 2014. Site-specific metrology, inspection, and failure analysis of three-dimensional interconnects using focused ion beam technology. Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 13, Issue. 1, p. 011202.

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Subramaniam, Srinivas Huening, Jennifer Richards, John and Johnson, Kevin 2017. A Comprehensive Approach Towards Optimizing the Xenon Plasma Focused Ion Beam Instrument for Semiconductor Failure Analysis Applications. Microscopy and Microanalysis, Vol. 23, Issue. 4, p. 769.

Hu, Changmin Yu, Le and Wei, Mei 2018. Sectioning studies of biomimetic collagen-hydroxyapatite coatings on Ti-6Al-4V substrates using focused ion beam. Applied Surface Science, Vol. 444, Issue. , p. 590.

Zhong, Xiangli Wade, C. Austin Withers, Philip J. Zhou, Xiaorong Cai, Changrun Haigh, Sarah J. and Burke, M. Grace 2021. Comparing Xe+pFIB and Ga+FIB for TEM sample preparation of Al alloys: Minimising FIB‐induced artefacts. Journal of Microscopy, Vol. 282, Issue. 2, p. 101.

Chizari, Samira Shaw, Lucas A. Behera, Dipankar Roy, Nilabh K. Zheng, Ximeng Panas, Robert M. Hopkins, Jonathan B. Chen, Shih-Chi and Cullinan, Michael A. 2021. Current challenges and potential directions towards precision microscale additive manufacturing – Part III: Energy induced deposition and hybrid electrochemical processes. Precision Engineering, Vol. 68, Issue. , p. 174.

Zhang, Yu Kong, Charlie Scardera, Giuseppe Abbott, Malcolm Payne, David N.R. and Hoex, Bram 2022. Large volume tomography using plasma FIB-SEM: A comprehensive case study on black silicon. Ultramicroscopy, Vol. 233, Issue. , p. 113458.

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A Comparison of Xenon Plasma FIB Technology with Conventional Gallium LMIS FIB: Imaging, Milling, and Gas-Assisted Applications

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