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Electron Beam-Induced Charging and Modifications of Thin Films

Published online by Cambridge University Press:  23 September 2015

Marek Malac
Affiliation:
National Institute of Nanotechnology, 11421 Saskatchewan Drive, Edmonton, Canada Department of Physics, University of Alberta, T6G 2E1, Edmonton, Canada
Marco Beleggia
Affiliation:
Centre of Electron Nanoscopy, Denmark Technical University, Denmark Helmholtz-Zentrum Berlin fuer Materialen und Energie, 14109 Berlin, Germany
Teddy Rowan
Affiliation:
National Institute of Nanotechnology, 11421 Saskatchewan Drive, Edmonton, Canada University of British Columbia. 2329 West Mall, Vancouver, V6T 1Z4, Canada
Ray Egerton
Affiliation:
National Institute of Nanotechnology, 11421 Saskatchewan Drive, Edmonton, Canada Department of Physics, University of Alberta, T6G 2E1, Edmonton, Canada
Masahiro Kawasaki
Affiliation:
JEOL Ltd. 1-2 Musashino 3 chome, Akishima, Tokyo 198-8558, Japan
Yoshio Okura
Affiliation:
JEOL Ltd. 1-2 Musashino 3 chome, Akishima, Tokyo 198-8558, Japan
Robert A. McLeod
Affiliation:
Fondation Nanosciences, 23 rue des Martyrs, 38000 Grenoble, France

Abstract

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Type
Abstract
Copyright
Copyright © Microscopy Society of America 2015 

References

[1] Reimer, L., Scanning Electron Microscopy, 2nd ed., Springer, 1998.Google Scholar
[2] Egerton, RF & Malac, M, Microscopy and Microanalysis 10(S02 (2004). p 1382.CrossRefGoogle Scholar
[3] Malac, M., et. al., Ultramicroscopy 118 (2012). p 77.Google Scholar
[4] Danev, R., et. al., PNAS 111 (2015). p 15635.Google Scholar
[5] Berriman, J. & Leonard, K. L., Ultramicroscopy 19 (1986). p 349.Google Scholar
[6] Support of NINT, NSERC, JEOL USA Inc. and JEOL Ltd. is gratefully acknowledged.Google Scholar