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Focused Ion Beam Milling for Site Specific Scanning and Transmission Electron Microscopy Specimen Preparation

Published online by Cambridge University Press:  02 July 2020

L.A. Giannuzzi ,
J.L. Drownt ,
S.R. Brown ,
R.B. Irwin  and
F.A. Stevie
L.A. Giannuzzi
Affiliation:
Department of Mechanical, Materials, and Aerospace Engineering, University of Central Florida, 4000 Central Florida Blvd., Orlando, FL, 32816-2450.
J.L. Drownt
Affiliation:
Department of Mechanical, Materials, and Aerospace Engineering, University of Central Florida, 4000 Central Florida Blvd., Orlando, FL, 32816-2450.
S.R. Brown
Affiliation:
Kirk Resources, 9333 S. John Young Parkway, Orlando, FL, 32819.
R.B. Irwin
Affiliation:
Cirent Semiconductor, 9333 S. John Young Parkway, Orlando, FL, 32819
F.A. Stevie
Affiliation:
Cirent Semiconductor, 9333 S. John Young Parkway, Orlando, FL, 32819
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Extract

It has been shown that a focused ion beam (FIB) instrument may be used to prepare site specific cross-sectioned specimens to within < 0.1 μm for both scanning and transmission electron microscopy (SEM and TEM, respectively). FIB specimen preparation has been used almost exclusively in the microelectronics industry. Recently, FIB specimen preparation has been utilized for other materials systems and applications.

A cross-sectioned SEM specimen is produced by sputtering away a trench of material from near the region of interest. Large amounts of material are sputtered using large ion beam diameters (e.g., l00’s nm) and high beam current (e.g., l000’s pA), while the final sputtering operations are achieved using smaller beam diameters (e.g., < 10 nm) and lower beam current (e.g., 10’s of pA). The SEM specimen may then be etched to reveal particular microstructural features of interest. A low magnification SEM image of a multi-layered device prepared for cross-section analysis by the FIB method is shown in FIG. 1.

Type
Technologists’ Forum: Special Topics and Symposium
Information
Microscopy and Microanalysis , Volume 3 , Issue S2: Proceedings: Microscopy & Microanalysis '97, Microscopy Society of America 55th Annual Meeting, Microbeam Analysis Society 31st Annual Meeting, Histochemical Society 48th Annual Meeting, Cleveland, Ohio, August 10-14, 1997 , August 1997 , pp. 347 - 348
Copyright
Copyright © Microscopy Society of America 1997

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References

1.Stevie, F. A.et al., Surf. Interface Anal., 23, 61 (1995).10.1002/sia.740230204CrossRefGoogle Scholar
2.Giannuzzi, et al., to be published.Google Scholar
3.Giannuzzi, et al., to be published, MRS Spring '97 Symposium on TEM Specimen Preparation, San Francisco, (1997).Google Scholar
4.Overwijk, M. H. F., et al., J. Vac. Sci. Technol., B11, 2021 (1993).10.1116/1.586537CrossRefGoogle Scholar
5.This work was funded by Cirent Semiconductor and encouraged by Bindell, J. Samples were obtained courtesy of Kelly, P., Lindsay, J., Santonino, M.. The SEM specimen was prepared by Shofner, T..Google Scholar