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Interfacial Roughness of HfxSi1-xO2 High-k films by TEM and AFM

Published online by Cambridge University Press:  22 July 2003

Brendan Foran
Affiliation:
International SEMATECH, 2706 Montopolis Dr. Austin, TX 7874
Carolyn Gondran
Affiliation:
International SEMATECH, 2706 Montopolis Dr. Austin, TX 7874
Pat Lysaght
Affiliation:
International SEMATECH, 2706 Montopolis Dr. Austin, TX 7874

Abstract

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Abstract
Copyright
Copyright © Microscopy Society of America 2003