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Nanoscale Engineering of Magnetic Textures in the Layered Magnet CrSBr Using Electrons and Helium Ions

Published online by Cambridge University Press:  22 July 2022

Julian Klein ,
Thang Pham ,
Joachim D. Thomsen ,
Jonathan B. Curtis ,
Michael Lorke ,
Matthias Florian ,
Alexander Steinhoff ,
Kate Reidy ,
Kierstin Torres  and
Ren A. Wiscons
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Julian Klein
Affiliation:
Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, United States
Thang Pham
Affiliation:
Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, United States
Joachim D. Thomsen
Affiliation:
Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, United States John A. Paulson School of Engineering and Applied Sciences, Harvard University, Cambridge, MA, United States
Jonathan B. Curtis
Affiliation:
John A. Paulson School of Engineering and Applied Sciences, Harvard University, Cambridge, MA, United States
Michael Lorke
Affiliation:
Institut für Theoretische Physik, Universität Bremen, Bremen, Germany
Matthias Florian
Affiliation:
Institut für Theoretische Physik, Universität Bremen, Bremen, Germany
Alexander Steinhoff
Affiliation:
Institut für Theoretische Physik, Universität Bremen, Bremen, Germany
Kate Reidy
Affiliation:
Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, United States
Kierstin Torres
Affiliation:
Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, United States
Ren A. Wiscons
Affiliation:
Department of Chemistry, Columbia University, New York, NY, United States
Jan Luxa
Affiliation:
Department of Inorganic Chemistry, University of Chemistry and Technology Prague, Prague, Czech Republic
Zdenek Sofer
Affiliation:
Department of Inorganic Chemistry, University of Chemistry and Technology Prague, Prague, Czech Republic
Frank Jahnke
Affiliation:
Institut für Theoretische Physik, Universität Bremen, Bremen, Germany
Prineha Narang
Affiliation:
John A. Paulson School of Engineering and Applied Sciences, Harvard University, Cambridge, MA, United States
Frances M. Ross*
Affiliation:
Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, United States
*
*Corresponding author: fmross@mit.edu

Abstract

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Type
Quantum Materials Under Electron Beam: From Atomic Structures to Working Devices
Information
Microscopy and Microanalysis , Volume 28 , Supplement S1 , August 2022 , pp. 1722 - 1723
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Copyright
Copyright © Microscopy Society of America 2022

References

Huang, B et al. , Nature 546 (2017), p. 270.Google Scholar
Göser, O, et al. , J. Magn. Magn. Mater. 92 (1990), p. 129.CrossRefGoogle Scholar
Telford, EJ, et al. , Adv. Mater. 32 (2020), p. 1.CrossRefGoogle Scholar
Wilson, N et al. , Nature Mater. (2021).Google Scholar
Klein, J et al. , arXiv:2107.00037 (2021)Google Scholar
J.K. and M.F. acknowledge support by the Alexander von Humboldt foundation. T.P. and F.M.R. acknowledge the funding from the U.S. Department of Energy, Office of Basic Energy Sciences, Division of Materials Sciences and Engineering under Award DE-SC0019336 for STEM characterization. J.D.T. acknowledges support from Independent Research Fund Denmark through grant no. 9035-00006B. Work by J.B.C. and P.N. is partially supported by the Quantum Science Center (QSC), a National Quantum Information Science Research Center of the U.S. Department of Energy (DOE). J.B.C. is an HQI Prize Postdoctoral Fellow and gratefully acknowledges support from the Harvard Quantum Initiative. P.N. is a Moore Inventor Fellow and gratefully acknowledges support through Grant GBMF8048 from the Gordon and Betty Moore Foundation. M.L, M.F., A.S. and F.J. were supported by the Deutsche Forschungsgemeinschaft (DFG) within RTG 2247 and through a grant for CPU time at the HLRN (Berlin/Göttingen). R.A.W. was supported by the Arnold O. Beckman Fellowship in Chemical Sciences. Z.S. and J.L. were supported by Czech Science Foundation (GACR No. 20-16124J).Google Scholar