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Towards 0.1 EV EELS Using a Beam Monochromator And Maxent Deconvolution

Published online by Cambridge University Press:  02 July 2020

P.C. Tiemeijer ,
M.H.F. Overwijk  and
A.F. de Jong
P.C. Tiemeijer
Affiliation:
FEI Electron Optics, P O Box 218, 5600, MD, Eindhoven, The Netherlands
M.H.F. Overwijk
Affiliation:
Philips Research, Prof. Holstlaan 4, 5656, AA, Eindhoven, The Netherlands
A.F. de Jong
Affiliation:
FEI Electron Optics, P O Box 218, 5600, MD, Eindhoven, The Netherlands
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Extract

The resolution in Electron Energy Loss Spectroscopy (EELS) in (S)TEM is presently limited by the instabilities of the high voltage supply (typically 0.2 eV), by the resolution of the spectrometer (typically 0.7 eV), and by the energy spread of the electron source (typically 0.7 eV for a Schottky field emitter). An increase of this resolution to better than 0.1 eV would enable chemical analysis on a nanometer scale. We are presently following hardware as well as software approaches in order to reach this energy resolution in a 200 kV (S)TEM.

The hardware side of our project focuses on the three limiting factors mentioned in the previous paragraph. The instabilities of the high voltage supply are mostly noise and drift, which can be reduced significantly by isolating the high voltage tank, thermally as well as acoustically. In addition, Gatan is developing an imaging filter for this project, which has sub-0.1 eV resolution.

Type
Electron Energy-Loss Spectroscopy (EELS) and Imaging
Information
Microscopy and Microanalysis , Volume 6 , Issue S2: Proceedings: Microscopy & Microanalysis 2000, Microscopy Society of America 58th Annual Meeting, Microbeam Analysis Society 34th Annual Meeting, Microscopical Society of Canada/Societe de Microscopie de Canada 27th Annual Meeting, Philadelphia, Pennsylvania August 13-17, 2000 , August 2000 , pp. 170 - 171
Copyright
Copyright © Microscopy Society of America

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References

1.Tiemeijer, P.C., Ultramicroscopy 78 (1999)53CrossRefGoogle Scholar
2.Tiemeijer, P.C., to appear in Proc. EMAG99 (Sheffield 1999)Google Scholar
3.Overwijk, M.H.F. and Reefman, D., to appear in MicronGoogle Scholar