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Chemical Fluid Deposition Enables Conformal Coating of High-Aspect-Ratio Features in Si Wafers

Published online by Cambridge University Press:  03 May 2012

Tim Palucka

Abstract

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Type
Research/Researchers
Information
MRS Bulletin , Volume 26 , Issue 12: New Aspects in Nanocrystal Research , December 2001 , pp. 970
Copyright
Copyright © Materials Research Society 2001