Hostname: page-component-848d4c4894-8kt4b Total loading time: 0 Render date: 2024-06-16T22:32:17.908Z Has data issue: false hasContentIssue false
  • English
  • Français

Fundamentals of Sputtered Neutral Mass Spectrometry

Published online by Cambridge University Press:  29 November 2013

U. Kaiser  and
J.C. Huneke
Get access

Abstract

Sputtered neutral mass spectrometry (SNMS) is a technique for elemental and isotopic analysis with excellent detection limits, with similar sensitivity for all elements and without substantial matrix effects. Particles sputter atomized from the sample surface are ionized and mass spectrometrically measured. Elemental detection limits are routinely 1–10 ppm, but can be as low as 1–10 ppb. Particular modes of SNMS enable the measurement of accurate concentration depth profiles with resolutions approaching 20 Å and the measurement of electrically insulating samples.

Type
Materials Microanalysis
Information
MRS Bulletin , Volume 12 , Issue 6 , September 1987 , pp. 48 - 51
Copyright
Copyright © Materials Research Society 1987

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1.Ho, P.S., Lewis, J.E., Wildman, H.S., and Howard, J.K., Surf. Sci. 57 (1976) p. 393.CrossRefGoogle Scholar
2.Deline, V.R., Katz, W., and Evans, C.A. Jr., Appl. Phys. Lett. 33(9) (1978) p. 832.CrossRefGoogle Scholar
3.Honig, R.E., J. Appl. Phys. 29 (1958) p. 549.CrossRefGoogle Scholar
4.Lipinsky, D., Jede, R., Ganschow, O., and Benninghoven, A., J. Vac. Sci. Technol. A3 (1985) p. 2007.CrossRefGoogle Scholar
5.Gnaser, H., Fleischhauer, J., and Hofer, W.O., Appl. Phys. A37 (1985) p. 211.CrossRefGoogle Scholar
6.Becker, C.H. and Gillen, K.T., Anal. Chem. 56 (1984) p. 1671; and “Surface Analysis by Laser Ionization,” by J.B. Pallix, C.H. Becker, and N. Newman in this issue of the MRS BULLETIN.CrossRefGoogle Scholar
7.Schueler, B. and Odom, R.W., J. Appl. Phys. 61 (1987) p. 4652.CrossRefGoogle Scholar
8.Oechsner, H. and Gerhard, W., Z. Phys. B22 (1975) p. 47.Google Scholar
9. Leybold-Heraeus GmbH, Cologne, West Germany, see: Jede, R., Peters, H., Dünnebier, G., Ganschow, O., Kaiser, U., and Seifert, K., J. Vac. Sci. Technol. (in press).Google Scholar
10. VG Elemental, Winsford, Cheshire, England.Google Scholar
11.Sander, P., Kaiser, U., Jede, R., Ganschow, O., and Benninghoven, A., J. Vac. Sci. Technol. A3 (1985) 1946.Google Scholar
12.Ganschow, O., in Secondary Ion Mass Spectrometry SIMS V, edited by Benninghoven, A., Colton, R.J., Simmons, D.S., and Werner, H. (Springer Series in Chemical Physics 44, Springer-Verlag, Berlin, 1985) p. 79.CrossRefGoogle Scholar
13.Werner, H.W., in Proceedings of the Conference on Electron and Ion Spectroscopy of Solids (Ghent, Belgium, 1977), edited by Fiermans, L., Vennik, J., and Dekeyser, W. (Plenum Press, New York, 1978) p. 324.Google Scholar
14.Deline, V.R., Evans, C.A. Jr., and Williams, P., Appl. Phys. Lett. 33 (1978) p. 578.CrossRefGoogle Scholar
15.Deline, V.R., Katz, W., Evans, C.A. Jr., and Williams, P., Appl. Phys. Lett. 33 (1978) p. 830.Google Scholar