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Silicon Surface Morphologies after Femtosecond Laser Irradiation

Published online by Cambridge University Press:  31 January 2011

Brian R. Tull ,
James E. Carey ,
Eric Mazur ,
Joel P. McDonald  and
Steven M. Yalisove
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Abstract

In this article, we present summaries of the evolution of surface morphology resulting from the irradiation of single-crystal silicon with femtosecond laser pulses. In the first section, we discuss the development of micrometer-sized cones on a silicon surface irradiated with hundreds of femtosecond laser pulses in the presence of sulfur hexafluoride and other gases. We propose a general formation mechanism for the surface spikes. In the second section, we discuss the formation of blisters or bubbles at the interface between a thermal silicon oxide and a silicon surface after irradiation with one or more femtosecond laser pulses. We discuss the physical mechanism for blister formation and its potential use as channels in microfluidic devices.

Keywords

laser ablationmorphologyoxideSi
Type
Research Article
Information
MRS Bulletin , Volume 31 , Issue 8: Ultrafast Lasers in Materials Research , August 2006 , pp. 626 - 633
Copyright
Copyright © Materials Research Society 2006

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