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Chemical grafting of silane end-functionalized polymer on silicon surfaces

Published online by Cambridge University Press:  15 February 2011

A Karim ,
S. K. Satija ,
W. Orts ,
J. F. Ankner ,
C. F. Majkrzak  and
L. J. Fetters
A Karim
Affiliation:
Reactor Radiation Division, NIST &University of Maryland, College Park, MD.
S. K. Satija
Affiliation:
Reactor Radiation Division, NIST &University of Maryland, College Park, MD.
W. Orts
Affiliation:
Reactor Radiation Division, National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899.
J. F. Ankner
Affiliation:
Reactor Radiation Division, National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899.
C. F. Majkrzak
Affiliation:
Reactor Radiation Division, National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899.
L. J. Fetters
Affiliation:
Exxon Research and Engineering Company, Rte 22 East, Annandale, New Jersey 08801.
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Abstract

X-ray and neutron reflectivity was used to determine the kinetics of adsorption and characterize the concentration profile of a low molecular weight trichlorosilane endfunctionalized polystyrene adsorbed onto polished silicon wafers. Higher adsorbed amounts were obtained from a cyclohexane solution of the polymer rather than toluene, with kinetics that followed a stretched exponential behavior. For moderately high grafting densities the polymer concentration profile in deuterated toluene (a good solvent) was best modelled using a small tailed parabola. In deuterated cyclohexane (a poor solvent) the brush profile steepened but was substantially smoother than a step, while in D20 (a non-solvent) it became step-like.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 304: Symposium H – Polymer/Inorganic Interfaces , 1993 , 149
Copyright
Copyright © Materials Research Society 1993

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