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Development Of Organic Photoresist For Color Filter Black Matrix

Published online by Cambridge University Press:  10 February 2011

C. W. Kim ,
S. G. Rho ,
D. K. Jung ,
E. J. Jeong ,
S. Y. Kim  and
H. G. Yang
C. W. Kim
Affiliation:
Samsung Electronics Co., Ltd., Kiheung, Korea
S. G. Rho
Affiliation:
Samsung Electronics Co., Ltd., Kiheung, Korea
D. K. Jung
Affiliation:
Samsung Electronics Co., Ltd., Kiheung, Korea
E. J. Jeong
Affiliation:
Samsung Electronics Co., Ltd., Kiheung, Korea
S. Y. Kim
Affiliation:
Samsung Electronics Co., Ltd., Kiheung, Korea
H. G. Yang
Affiliation:
Samsung Electronics Co., Ltd., Kiheung, Korea
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Abstract

Normal CrOx/Cr type color filter black matrix requires multi-layer sputtering and photo/etch processes which cause several problems such as particles generation, high production cost, and environmental issues. Various kinds of materials are being reviewed to substitute the existing Cr base materials. Especially carbon based organic type and pigment type photo-sensitive materials are actively under development. Our researches are focused on the characterization of material properties, color filter manufacturing techniques which are optimized for liquid crystal process, and the display quality of newly developed materials. Carbon based organic photoresist has excellent optical, material, and process properties which can be used for TFT-LCD color filter products. 14.2″ VGA panel is fabricated by using this organic black matrix technique. It is expected that this technique will lead the color filter production market.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 424: Symposium H – Flat Panel Display Materials II , 1996 , 329
Copyright
Copyright © Materials Research Society 1997

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